US 12,401,167 B2 · Gas control method and related uses

Abstract

Provided is a gas control system and method for online control of a gas compartment of a radiation source. The method includes measuring a parameter of a radiation source such as an excimer laser, the parameter describing an electrical stimulation applied to the laser and/or a characteristic of radiation generated by the laser and/or an amount of a consumable in the gas compartment. A function of the parameter is compared a to a threshold and if the parameter breaches the threshold, an amount of gas is calculated based on the parameter. An instruction is provided to provide or remove the amount of gas to or from, the gas compartment. Gases may be injected or bled into the compartment during use of the radiation source thereby reducing or negating the need to take the radiation source offline to purge and refill the gas compartment.

Claims28

Dependent claims

A method of controlling a gas control system of a gas compartment of a radiation source, the method comprising:

measuring a parameter of an excimer laser, wherein the parameter describes an electrical stimulation applied to the excimer laser and/or a characteristic of radiation generated by the excimer laser and/or an amount of a consumable in the gas compartment;
comparing the parameter, or a function of the parameter, to a threshold;
calculating, responsive to determining that the parameter or function of the parameter breaches the threshold, an amount of gas to be provided to the gas compartment based on the parameter;
and
providing an instruction to the gas control system to provide the amount of gas to the gas compartment while the radiation source continues to generate radiation during the provision of gas to the gas compartment.

2 more elements

Dependencies are inferred from the claim text.

Gas control method and related uses

Life of this patent

Gas control method and related uses

Life of this patent

Abstract

Claims28