H01J 37/301
Arrangements enabling beams to pass between regions of different pressure
H01J37/301 (Arrangements enabling beams to pass between regions of different pressure) appears on 52 US grants and 35 published applications in this corpus.
Search patents in H01J- Granted patents
- 52
- Published applications
- 35
- Assignees
- 42
- Inventors
- 122
- Latest grant
- 17 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 3 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 3 | 4 |
| 2003 | 3 | 2 |
| 2004 | 2 | 1 |
| 2005 | 1 | 0 |
| 2006 | 2 | 1 |
| 2007 | 1 | 2 |
| 2008 | 0 | 1 |
| 2009 | 0 | 0 |
| 2010 | 1 | 2 |
| 2011 | 1 | 3 |
| 2012 | 2 | 2 |
| 2013 | 1 | 0 |
| 2014 | 3 | 2 |
| 2015 | 2 | 2 |
| 2016 | 1 | 1 |
| 2017 | 0 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 2 |
| 2020 | 1 | 0 |
| 2021 | 0 | 1 |
| 2022 | 3 | 3 |
| 2023 | 1 | 2 |
| 2024 | 0 | 1 |
| 2025 | 1 | 1 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Differential pumping apparatus and focused charged particle beam system17 Feb 2026US 12,555,739 B2V Technology Co., Ltd.
- Focused ion beam system8 Jul 2025US 12,354,828 B2V Technology Co., Ltd.
- Particle yield via beam-line pressure control24 Jan 2023US 11,562,885 B2APPLIED Materials.Inc.
- Enhanced electron beam generation6 Dec 2022US 11,517,975 B2Arcam AB
- Electron beam 3D printing machine28 Jun 2022US 11,370,055 B2Consorzio Di Ricerca Hypatia
- Electron beam device for surface treatment16 Oct 2025US 2025/0323006 A1
- Electron beam welding systems employing a plasma cathode9 May 2024US 2024/0153739 A1US Electron, Inc.
- Focused ion beam system28 Sep 2023US 2023/0307205 A1V Technology Co., Ltd.
- Differential pumping apparatus and focused energy beam system8 Jun 2023US 2023/0178335 A1V Technology Co., Ltd.
- Electron beam welding systems employing a plasma cathode1 Dec 2022US 2022/0384138 A1
Most cited
By later US patents
- Charged particle beam lithography machine incorporating localized vacuum envelope75US 4,607,167 AVarian Associates, Inc. · 1986
- Ion and charged particle source for production of thin films62US 6,878,930 B12005
- Electron beam lithographic apparatus57US 4,425,508 AGCA Corporation · 1984
- Envelope apparatus for localized vacuum processing54US 4,584,479 AVarian Associates, Inc. · 1986
- Electron beam source employing a photo-emitter cathode37US 4,820,927 AControl Data Corporation · 1989