Focused ion beam system
AssigneeV Technology Co., Ltd.
InventorMichinobu Mizumura
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AssigneeV Technology Co., Ltd.
InventorMichinobu Mizumura
Estimating the term…
A focused ion beam system has a differentially-pumped vacuum unit and a focused ion beam column, comprising: a vacuum pad, of a porous material, with a suction surface exposed in a way that surrounds the outer edge of a substrate to be processed; a substrate support on which the substrate and vacuum pad are placed, and a vacuum pump for vacuum evacuation using the vacuum pad. The system provides an arrangement in which, while a head of the differentially-pumped vacuum unit partially falls out of the outer edge of the substrate, the suction surface allows an input of air evacuated from a region between the suction surface and the head, and the processing area on a substrate is expanded by allowing the processing with an ion beam to be performed even in the vicinity of the peripheral substrate surface without requiring a large vacuum chamber.
A focused ion beam system including a differentially-pumped vacuum unit, and a focused ion beam column,
Dependencies are inferred from the claim text.