H01J 2237/2594
Measuring electric fields or potentials
H01J2237/2594 (Measuring electric fields or potentials) appears on 79 US grants and 76 published applications in this corpus.
Search patents in H01J- Granted patents
- 79
- Published applications
- 76
- Assignees
- 38
- Inventors
- 168
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 1 | 1 |
| 2003 | 6 | 1 |
| 2004 | 0 | 5 |
| 2005 | 3 | 12 |
| 2006 | 3 | 4 |
| 2007 | 5 | 7 |
| 2008 | 7 | 8 |
| 2009 | 7 | 7 |
| 2010 | 6 | 3 |
| 2011 | 3 | 1 |
| 2012 | 3 | 3 |
| 2013 | 4 | 4 |
| 2014 | 5 | 0 |
| 2015 | 0 | 1 |
| 2016 | 1 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 3 |
| 2021 | 4 | 3 |
| 2022 | 2 | 5 |
| 2023 | 1 | 2 |
| 2024 | 1 | 3 |
| 2025 | 4 | 2 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Automated application of drift correction to sample studied under electron microscope15 Sep 2026US 12,739,513 B2Protochips, Inc.
- Information processing system and phase analysis system7 Jul 2026US 12,676,287 B2Hitachi, Ltd.
- Metal pattern inspection method and focused ion beam apparatus28 Oct 2025US 12,456,599 B2V Technology Co., Ltd.
- Interference scanning transmission electron microscope2 Sep 2025US 12,406,825 B2Hitachi, Ltd.
- In-lens wafer PE-charging and inspection with multiple beams29 Jul 2025US 12,374,524 B2ASML Netherlands B. V.
- Automated application of drift correction to sample studied under electron microscope14 Aug 2025US 2025/0260901 A1Protochips, Inc.
- Method for voltage contrast imaging with a corpuscular multi-beam microscope, corpuscular multi-beam microscope for voltage contrast imaging and semiconductor structures for voltage contrast imaging with a corpuscular multi-beam microscope26 Jun 2025US 2025/0210302 A1
- Substrate inspection method12 Dec 2024US 2024/0412943 A1Samsung Electronics Co., Ltd.
- Automated application of drift correction to sample studied under electron microscope8 Aug 2024US 2024/0267628 A1Protochips, Inc.
- Information processing system and phase analysis system13 Jun 2024US 2024/0192152 A1Hitachi, Ltd.
Most cited
By later US patents
- Feature-based defect detection256US 6,539,106 B1APPLIED Materials.Inc. · 2003
- Voltage contrast method for semiconductor inspection using low voltage particle beam157US 6,344,750 B12002
- Method of probing a net of an IC at an optimal probe-point121US 5,530,372 ASchlumberger Technologies, Inc. · 1996
- Optimal probe point placement113US 5,675,499 ASchlumberger Technologies, Inc. · 1997
- Electrical process monitoring using mirror-mode electron microscopy85US 7,514,681 B1KLA-Tencor Technologies Corporation · 2009