Substrate inspection method

A substrate inspection method, comprising:

• executing, by a controller coupled to a scanning electron microscope, instructions stored in a non-transitory storage medium to perform operations comprising:
• reducing a surface potential of a substrate;
• increasing a difference of the surface potential of the substrate;
• and
• observing the substrate by irradiating an electron beam to the substrate,
• wherein the substrate comprises a first domain and a second domain,
• wherein reducing the surface potential of the substrate comprises:
• irradiating the electron beam to the first domain and the second domain for a first irradiation time;
• and
• in response to controlling the scanning electron microscope to irradiate the electron beam to the first domain and the second domain for the first irradiation time and after a first standby time, re-irradiating the electron beam to the first domain and the second domain for the first irradiation time,
• wherein increasing the difference of the surface potential comprises:
• irradiating the electron beam to the first domain and the second domain for a second irradiation time;
• and
• in response to controlling the scanning electron microscope to irradiate the electron beam to the first domain and the second domain for the second irradiation time and after a second standby time, re-irradiating the electron beam to the first domain and the second domain for the second irradiation time, and
• wherein observing the substrate comprises measuring, by the scanning electron microscope, a difference between a gray level of the first domain and a gray level of the second domain.

A substrate inspection method, comprising:

• executing, by a controller coupled to a scanning electron microscope, instructions stored in a non-transitory storage medium to perform operations comprising:
• increasing a gray level of a substrate;
• and
• increasing a difference of the gray level of the substrate,
• wherein the substrate comprises a first domain and a second domain,
• wherein increasing the gray level of the substrate comprises controlling the scanning electron microscope to irradiate an electron beam to the substrate for a first irradiation time to increase a gray level of each of the first domain and the second domain,
• wherein increasing the difference in gray level of the substrate comprises controlling the scanning electron microscope to irradiate the electron beam to the substrate for a second irradiation time, and
• wherein the second irradiation time is greater than the first irradiation time.