H01J 2237/162
Open vessel, i.e. one end sealed by object or workpiece
H01J2237/162 (Open vessel, i.e. one end sealed by object or workpiece) appears on 34 US grants and 32 published applications in this corpus.
Search patents in H01J- Granted patents
- 34
- Published applications
- 32
- Assignees
- 30
- Inventors
- 109
- Latest grant
- 17 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 3 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 3 |
| 2004 | 2 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 2 |
| 2007 | 0 | 3 |
| 2008 | 3 | 0 |
| 2009 | 2 | 1 |
| 2010 | 0 | 3 |
| 2011 | 2 | 1 |
| 2012 | 2 | 1 |
| 2013 | 1 | 1 |
| 2014 | 0 | 0 |
| 2015 | 2 | 2 |
| 2016 | 1 | 2 |
| 2017 | 0 | 1 |
| 2018 | 2 | 1 |
| 2019 | 1 | 0 |
| 2020 | 0 | 1 |
| 2021 | 1 | 1 |
| 2022 | 0 | 0 |
| 2023 | 0 | 7 |
| 2024 | 0 | 0 |
| 2025 | 4 | 0 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Differential pumping apparatus and focused charged particle beam system17 Feb 2026US 12,555,739 B2V Technology Co., Ltd.
- Process apparatus including differential pumping device and focused ion beam column27 Jan 2026US 12,537,164 B2V Technology Co., Ltd.
- Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedestal for multiphase cyclic deposition23 Dec 2025US 12,505,988 B2APPLIED Materials.Inc.
- Device for generating a dielectric barrier discharge and method for treating an object to be activated4 Nov 2025US 12,463,024 B2TDK Electronics Co., Ltd.
- Focused charged particle beam apparatus14 Oct 2025US 12,444,567 B2V Technology Co., Ltd.
- Process apparatus7 Dec 2023US 2023/0395353 A1V Technology Co., Ltd.
- Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedestal for multiphase cyclic deposition7 Dec 2023US 2023/0395356 A1APPLIED Materials.Inc.
- Focused charged particle beam apparatus19 Oct 2023US 2023/0335369 A1V Technology Co., Ltd.
- Focused ion beam system28 Sep 2023US 2023/0307205 A1V Technology Co., Ltd.
- Differential pumping apparatus and focused energy beam system8 Jun 2023US 2023/0178335 A1V Technology Co., Ltd.
Most cited
By later US patents
- Charged particle beam lithography machine incorporating localized vacuum envelope75US 4,607,167 AVarian Associates, Inc. · 1986
- Low-temperature, converging, reactive gas source and method of use68US 8,328,982 B1Surfx Technologies LLC · 2012
- Sputtering process burnable poison coating47US 5,272,735 ACombustion Engineering, Inc. · 1993
- Method and apparatus for cleaning surfaces with plasma45US 5,236,512 AThiokol Corporation · 1993
- Apparatus and method for inspection and testing of flat panel display substrates16US 7,435,956 B2Multibeam Systems, Inc. · 2008