Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedestal for multiphase cyclic deposition

A plasma treatment chamber, comprising:

• a chamber body having an opening in a top surface thereof;
• a rotatable pedestal within the chamber body having a support surface to hold and rotate a workpiece in a processing region;
• a cross-flow pumping ring mounted over the top surface of the chamber body and the opening in the chamber body, the cross-flow pumping ring further comprising:
• two opposing curved corners that wrap around a circular shape of the rotatable pedestal, and two opposing right-angled corners connected to the two opposing curved corners, the two opposing right-angled corners providing sufficient space for housing a first gas injector and a first pump port, respectively;
• a first cross-flow showerhead disposed between the first gas injector and the workpiece to distribute injected gas across the workpiece, wherein the first cross-flow showerhead includes a first plurality of slots arranged in 1) columns having a height that extends substantially a height of the cross-flow showerheads or 2) rows having a length that extends substantially a length of the cross-flow showerheads;
• and
• a second cross-flow showerhead disposed between the workpiece and the first pump port to prevent plasma from entering the first pump port, wherein the first cross-flow showerhead includes a second plurality of slots, wherein the first and second cross-flow showerheads are located on an interior bottom of the cross-flow pumping ring and extend upwards to meet an interior top portion of the cross-flow pumping ring so that the gas flow is channeled through the first and second cross-flow showerheads;
• a lid over the cross-flow pumping ring, the lid having a plurality of microwave resonators, and hinges that allow the lid to open and close over the cross-flow pumping ring and the rotatable pedestal;
• and
• a controller configured to operate a multiphase rotating cross-flow comprising at least:
• a first phase comprising injecting, by the first gas injector in the cross-flow pumping ring, a first gas flow generally parallel to and across a surface of the workpiece, and pumping out, by the first pump port in the cross-flow pumping ring, the first gas flow;
• rotating the rotatable pedestal to rotate the workpiece a predetermined angular distance;
• and
• a second phase comprising injecting, by the first gas injector, a second gas flow generally parallel to and across the surface of the workpiece, and pumping out, by the first pump port, the second gas flow.