H01J 2237/0656
Density
H01J2237/0656 (Density) appears on 15 US grants and 22 published applications in this corpus.
Search patents in H01J- Granted patents
- 15
- Published applications
- 22
- Assignees
- 14
- Inventors
- 61
- Latest grant
- 29 Oct 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2003 | 1 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 2 | 2 |
| 2012 | 2 | 2 |
| 2013 | 0 | 1 |
| 2014 | 2 | 1 |
| 2015 | 0 | 1 |
| 2016 | 1 | 1 |
| 2017 | 1 | 2 |
| 2018 | 1 | 3 |
| 2019 | 1 | 1 |
| 2020 | 0 | 2 |
| 2021 | 0 | 0 |
| 2022 | 1 | 0 |
| 2023 | 1 | 2 |
| 2024 | 1 | 1 |
| 2025 | 0 | 1 |
By publication year.
Recent patents
- Method and apparatus for usable beam current and brightness in Schottky thermal field emission (TFE)29 Oct 2024US 12,131,883 B2NuFlare Technology America, Inc.
- Method and apparatus for usable beam current and brightness in Schottky thermal field emission (TFE)21 Nov 2023US 11,823,862 B2NuFlare Technology America, Inc.
- Electron microscope15 Feb 2022US 11,251,011 B2Hitachi High-Tech Corporation
- Gun lens design in a charged particle microscope10 Sep 2019US 10,410,827 B2FEI Company
- System and method for increasing electron density levels in a plasma of a substrate processing system4 Dec 2018US 10,147,588 B2Lam Research Corporation
- Photo-assisted electron beam emitter20 Feb 2025US 2025/0062095 A1Board of Trustees of Michigan State University
- Charged Particle Beam Device22 Feb 2024US 2024/0062986 A1Hitachi High-Tech Corporation
- Method and apparatus for usable beam current and brightness in schottky thermal field emission (tfe)21 Dec 2023US 2023/0411114 A1NuFlare Technology America, Inc.
- Method and apparatus for usable beam current and brightness in schottky thermal field emission (tfe)29 Jun 2023US 2023/0207257 A1NuFlare Technology America, Inc.
- Low-temperature ionization of metastable atoms emitted by an inductively coupled plasma ion source5 Nov 2020US 2020/0350142 A1
Most cited
By later US patents
- Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems8US 6,528,799 B1Elith LLC · 2003
- Method for measurement of beam emittance in a charged particle transport system7US 6,763,316 B2Varian Semiconductor Equipment Associates, Inc. · 2004
- System and method for increasing electron density levels in a plasma of a substrate processing system6US 10,147,588 B2Lam Research Corporation · 2018
- Electron microscope2US 11,251,011 B2Hitachi High-Tech Corporation · 2022
- Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication2US 9,767,991 B2Lam Research Corporation · 2017