H01J 2237/0455
With variable aperture
Official title: with variable aperture
H01J2237/0455 (With variable aperture) appears on 93 US grants and 97 published applications in this corpus.
Search patents in H01J- Granted patents
- 93
- Published applications
- 97
- Assignees
- 57
- Inventors
- 261
- Latest grant
- 30 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 2 | 2 |
| 2007 | 1 | 6 |
| 2008 | 2 | 4 |
| 2009 | 4 | 8 |
| 2010 | 5 | 4 |
| 2011 | 5 | 6 |
| 2012 | 7 | 3 |
| 2013 | 4 | 1 |
| 2014 | 6 | 5 |
| 2015 | 3 | 3 |
| 2016 | 5 | 5 |
| 2017 | 2 | 2 |
| 2018 | 3 | 3 |
| 2019 | 4 | 6 |
| 2020 | 6 | 9 |
| 2021 | 5 | 3 |
| 2022 | 3 | 5 |
| 2023 | 5 | 8 |
| 2024 | 5 | 6 |
| 2025 | 6 | 4 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Focused ion beam system2 Jun 2026US 12,646,680 B2V Technology Co., Ltd.
- Systems and methods for charged particle flooding to enhance voltage contrast defect signal9 Dec 2025US 12,494,342 B2ASML Netherlands B. V.
- System and method for ion source temperature control using symmetric or asymmetric application of force18 Nov 2025US 12,476,087 B2APPLIED Materials.Inc.
- Charged particle beam pattern forming device and charged particle beam apparatus1 Jul 2025US 12,347,641 B2Kabushiki Kaisha Toshiba
- Charged particle beam writing apparatus18 Jun 2026US 2026/0171352 A1NuFlare Technology, Inc.
- Ultra fast pulser for low energy electron beams21 May 2026US 2026/0142118 A1Euclid Techlabs, LLC
- Ion extraction optics with dynamic extraction angle control25 Dec 2025US 2025/0391633 A1APPLIED Materials.Inc.
- Scanning electron microscope (sem) image improving method9 Oct 2025US 2025/0316443 A1Samsung Electronics Co., Ltd.
- Charged particle beam device11 Sep 2025US 2025/0285827 A1Hitachi High-Tech Science Corporation
Most cited
By later US patents
- Improved ion implantation using a variable mass resolving system20US 5,130,552 AAPPLIED Materials.Inc. · 1992
- Contour collimator18US 5,165,106 ASiemens Medical Laboratories, Inc. · 1992
- Ion implantation apparatus with variable width slits providing an ion beam of high purity17US 5,216,253 AHitachi, Ltd. · 1993
- Charged particle beam apparatus16US 5,065,034 AHitachi, Ltd. · 1991
- Charged particle beam system having beam-defining slit formed by rotating cyclinders14US 5,629,528 AVarian Associates, Inc. · 1997