Charged particle beam pattern forming device and charged particle beam apparatus
AssigneeKabushiki Kaisha Toshiba
InventorsHiroko Nakamura, Tomohiro Saito, Yoshiaki Shimooka
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Abstract
A charged particle beam pattern forming device is described, a charged particle beam passing through a third aperture for forming a charged particle beam pattern, the charged particle beam pattern forming device including: a first element including a first aperture, a second element including a second aperture, the second aperture overlapping the first aperture, wherein the third aperture is defined by an overlap of the first aperture and the second aperture, and a shape of the third aperture is capable of being changed by a driver such that the first element is moved in a first direction and the second element is moved in a second direction opposite to the first direction.
Claims20
A charged particle beam pattern forming device, a charged particle beam passing through a third aperture for forming a charged particle beam pattern, the charged particle beam pattern forming device comprising:
- a first element including a plurality of first apertures arranged periodically, and
- a second element including a plurality of second apertures arranged periodically, the second plurality of apertures overlapping the first plurality of apertures,
- wherein each of a plurality of third apertures are defined by an overlap of a corresponding first aperture and a corresponding second aperture, and a shape of each third aperture is capable of being changed by a driver such that the first element is moved in a first direction and the second element is moved in a second direction opposite to the first direction, and
- wherein the driver is configured to move the first element and the second element such that a center of each third aperture provided by the overlap of the corresponding first aperture and the corresponding second aperture is a designed optical axis of the charged particle beam pattern to be formed.
A charged particle beam pattern forming device, a charged particle beam passing through a third aperture for forming a charged particle beam pattern, the charged particle beam pattern forming device comprising:
- a first element including a first aperture, and
- a second element including a second aperture, the second aperture overlapping the first aperture,
- wherein the third aperture is defined by an overlap of the first aperture and the second aperture, and a shape of the third aperture is capable of being changed by a driver such that the first element is moved in a first direction and the second element is moved in a second direction opposite to the first direction, and
- wherein the driver includes
- a first stepper motor,
- a first pinion gear connected to the first stepper motor, and the first pinion gear being rotatable in a predetermined plane including the first direction and the second direction,
- a first rack gear meshed with the first pinion gear, and the first rack gear being capable of moving the first element in the first direction,
- a second stepper motor,
- a second pinion gear connected to the second stepper motor, and the second pinion gear being rotatable in the predetermined plane, and
- a second rack gear meshed with the second pinion gear, and the second rack gear being capable of moving the second element in the second direction.
A charged particle beam pattern forming device, a charged particle beam passing through a third aperture for forming a charged particle beam pattern, the charged particle beam pattern forming device comprising:
- a first element including a first aperture,
- a second element including a second aperture, the second aperture overlapping the first aperture,
- a first semiconductor layer provided below the first element and the second element, and the first semiconductor layer being provided separately from the first element and the second element, and
- a second semiconductor layer provided above the first element and the second element, and the second semiconductor layer being provided separately from the first element and the second element,
- wherein the third aperture is defined by an overlap of the first aperture and the second aperture, and a shape of the third aperture is capable of being changed by a driver such that the first element is moved in a first direction and the second element is moved in a second direction opposite to the first direction, and
- wherein the driver includes
- a first electrode connected to the first element,
- a second electrode connected to the second element,
- a third semiconductor layer provided between the first semiconductor layer and the second semiconductor layer, and the third semiconductor layer being provided separately from the first element in the first direction or in the second direction,
- a third electrode connected to the third semiconductor layer,
- a fourth semiconductor layer provided between the first semiconductor layer and the second semiconductor layer, and the fourth semiconductor layer being provided separately from the second element in the first direction or in the second direction, and
- a fourth electrode connected to the fourth semiconductor layer.
Dependencies are inferred from the claim text.