H01J 2237/036
Spacing
H01J2237/036 (Spacing) appears on 21 US grants and 31 published applications in this corpus.
Search patents in H01J- Granted patents
- 21
- Published applications
- 31
- Assignees
- 23
- Inventors
- 74
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2007 | 0 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 1 | 2 |
| 2011 | 0 | 0 |
| 2012 | 2 | 1 |
| 2013 | 0 | 3 |
| 2014 | 2 | 3 |
| 2015 | 2 | 2 |
| 2016 | 1 | 2 |
| 2017 | 1 | 2 |
| 2018 | 3 | 0 |
| 2019 | 1 | 0 |
| 2020 | 0 | 2 |
| 2021 | 3 | 1 |
| 2022 | 0 | 1 |
| 2023 | 0 | 1 |
| 2024 | 1 | 4 |
| 2025 | 3 | 4 |
| 2026 | 1 | 2 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Proximity-electrode, charged particle beam device and method for inspecting and/or imaging a sample16 Jun 2026US 12,658,401 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Active gas generation apparatus23 Sep 2025US 12,424,418 B2TMEIC Corporation
- Tunable plasma exclusion zone in semiconductor fabrication24 Jun 2025US 12,340,987 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate processing apparatus7 Jan 2025US 12,188,126 B2Jusung Engineering Co., Ltd.
- Electrostatic chucking process24 Sep 2024US 12,100,609 B2APPLIED Materials.Inc.
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Charged particle device and charged particle apparatus9 Jul 2026US 2026/0196439 A1ASML Netherlands B. V.
- Isolating spacer for electron-optical assembly13 Nov 2025US 2025/0349495 A1ASML Netherlands B. V.
- Spacer for an orifice element26 Jun 2025US 2025/0210337 A1Thermo Fisher Scientific (Bremen) GmbH
- Substrate processing apparatus10 Apr 2025US 2025/0116004 A1Jusung Engineering Co., Ltd.
Most cited
By later US patents
- High-voltage insulation device for charged-particle optical apparatus23US 9,093,201 B2IMS Nanofabrication GmbH · 2015
- X-ray generation device having multiple metal target members12US 10,115,557 B2Hamamatsu Photonics K.K. · 2018
- Insulation structure of high voltage electrodes for ion implantation apparatus5US 9,117,630 B2Sumitomo Heavy Industries Ion Technology Co., Ltd. · 2015
- Beam optical component for charged particle beams4US 7,675,042 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2010
- Insulation structure and insulation method3US 9,281,160 B2Sumitomo Heavy Industries Ion Technology Co., Ltd. · 2016