G21K 2201/061
Characterised by a multilayer structure
Official title: characterised by a multilayer structure
G21K2201/061 (Characterised by a multilayer structure) appears on 187 US grants and 163 published applications in this corpus.
Search patents in G21K- Granted patents
- 187
- Published applications
- 163
- Assignees
- 105
- Inventors
- 453
- Latest grant
- 18 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 4 | 0 |
| 1988 | 3 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 4 | 0 |
| 1995 | 6 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 3 | 1 |
| 2003 | 3 | 2 |
| 2004 | 2 | 2 |
| 2005 | 0 | 8 |
| 2006 | 2 | 5 |
| 2007 | 7 | 17 |
| 2008 | 15 | 10 |
| 2009 | 7 | 14 |
| 2010 | 9 | 7 |
| 2011 | 7 | 20 |
| 2012 | 16 | 11 |
| 2013 | 11 | 12 |
| 2014 | 5 | 11 |
| 2015 | 4 | 3 |
| 2016 | 11 | 3 |
| 2017 | 6 | 5 |
| 2018 | 5 | 4 |
| 2019 | 6 | 5 |
| 2020 | 4 | 6 |
| 2021 | 3 | 4 |
| 2022 | 3 | 4 |
| 2023 | 7 | 4 |
| 2024 | 2 | 1 |
| 2025 | 4 | 2 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Multilayer collimator, and method for manufacturing a multilayer collimator18 Nov 2025US 12,474,490 B2Hitachi High-Tech Analytical Science Finland Oy
- Speckle-based imaging diffuser and method for controllably fabricating same23 Sep 2025US 12,424,346 B1National Technology & Engineering Solutions of Sandia, LLC
- Mirror, in particular for microlithography15 Apr 2025US 12,276,917 B2Carl Zeiss SMT GmbH
- Mirror, in particular for a microlithographic projection exposure apparatus28 Jan 2025US 12,210,289 B2Carl Zeiss SMT GmbH
- Mask blank glass substrate15 Oct 2024US 12,117,724 B2Shin-Etsu Chemical Co., Ltd.
- Beam-modifying devices for ultra-high dose rate radiation therapy1 Oct 2026US 2026/0304590 A1Ohio State Innovation Foundation
- Intermediate product for producing an optical element for a projection exposure apparatus, optical element for a projection exposure apparatus, method for producing an intermediate product, and method for producing an optical element12 Jun 2025US 2025/0189900 A1Carl Zeiss SMT GmbH
- Conic zoneplate fabrication technique6 Feb 2025US 2025/0046488 A1Uchicago Argonne, LLC
- Mask Blank Glass Substrate15 Feb 2024US 2024/0053675 A1Shin-Etsu Chemical Co., Ltd.
- Multilayer collimator, and method for manufacturing a multilayer collimator26 Oct 2023US 2023/0341566 A1Hitachi High-Tech Analytical Science Finland Oy
Most cited
By later US patents
- Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors473US 7,692,171 B22010
- High efficiency replicated x-ray optics and fabrication method112US 6,278,764 B1The Regents of the Unviersity of California · 2001
- X-ray wave diffraction optics constructed by atomic layer epitaxy88US 5,458,084 AMoxtek, Inc. · 1995
- EUV light source80US 7,164,144 B2Cymer, Inc. · 2007
- Method of fabricating periodic monolayer semiconductor structures by molecular beam epitaxy74US 4,261,771 ABell Telephone Laboratories, Incorporated · 1981