X-ray wave diffraction optics constructed by atomic layer epitaxy

An x-ray wave diffraction apparatus comprising

• a substrate having a surface area, and
• a first layer of material on the substrate, the first layer of material having a first index of refraction and a first thickness,
• a second layer of material on top of the first layer of material, the second layer of material having a second thickness and a second index of refraction, and
• a plurality of pairs of the first layers and the second layers with each of the second layers being grown by atomic layer epitaxy on each of the first layers such that the combined thickness of each pair of the first and second layers is about twelve angstroms or less and the thickness of all the first layers of each pair of layers is substantially the same as the thickness of each corresponding layer of every other pair and the thickness of all the second layers of each pair of layers is substantially the same as the thickness of each corresponding layer of every other pair and one of the first or second indices of refraction being a high index of refraction with the other of the first or second indices of refraction being a low index of refraction such that each pair of adjacent layers alternates between a layer with a high index or refraction and a layer with a low index of refraction such that x-rays impinging thereon are reflected.

A method of constructing a narrow band, highly reflective x-ray diffraction structure comprising the steps of

• (a) providing a substrate having a surface area, and
• (b) growing a first layer of material by atomic layer epitaxy, the first layer of material having a first index of refraction and a first thickness,
• (c) growing a second layer of material by atomic layer epitaxy, the second layer of material having a second thickness and a second refraction index which is different from the first refractive index,
• (d) repeating steps b and c to form multiple pairs of first layers and second layers with each second layer being grown on the first layers such that the combined thickness of each pair of layers formed by the first and second layers is 12 angstroms or less and the thickness of all first layers being substantially the same as that of the corresponding layer of every other pair and the thickness of all of the second layers each being substantially the same as that of the corresponding layer of every other pair and one of the first or second indices of refraction being a high index of refraction and the other of the first or second indices being a low index of refraction such that x-ray waves impinging thereon are reflected.

A narrow band x-ray diffraction apparatus comprising

• a substrate having a surface area,
• a first layer of material disposed on the substrate by atomic layer epitaxy, the first layer of material comprising a member from the group consisting of lead telluride, aluminum nitride, zinc selenide, cadmium sulfide, silicon, boron nitride, gallium arsenide and carbon, the first layer having a first refraction index and a first thickness,
• a second layer of material disposed on the substrate by atomic layer epitaxy, the second layer of material comprising a member from the group consisting of lead telluride, aluminum nitride, zinc selenide, cadmium sulfide, silicon, boron nitride, gallium arsenide and carbon, the first layer having a second refraction index and a second thickness,
• a plurality of pairs of the first layers and the second layers with each of the second layers being grown on each of the first layers such that the combined thickness of each pair of the first and second layers is no more than twelve angstroms, and the thickness of all of the first layers of each pair of layers is substantially the same as the thickness of each corresponding layer of every other pair and the thickness of all the second layers of each pair of layers is substantially the same as the thickness of each corresponding layer of every other pair, and one of the first or second indices of refraction being a high index of refraction and the other of the first or second indices being a low index of refraction such that x-ray waves impinging thereon are reflected.