Mirror, in particular for microlithography
AssigneeCarl Zeiss SMT GmbH
InventorsJan Horn, Mohammad Awad, Kerstin Hild
Life of this patent
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AssigneeCarl Zeiss SMT GmbH
InventorsJan Horn, Mohammad Awad, Kerstin Hild
Estimating the term…
A mirror including a substrate (110), a reflection layer system (120), and at least one continuous piezoelectric layer (130, . . . ) arranged between the substrate and the layer system. An electric field producing a locally variable deformation is applied to the piezoelectric layer via a first, layer-system-side electrode arrangement and a second, substrate-side electrode arrangement. At least one of the electrode arrangements is assigned a mediator layer (170) setting an at least regionally continuous profile of the electrical potential along the respective electrode arrangement. The electrode arrangement to which the mediator layer is assigned has a plurality of electrodes (160, . . . ), each of which is configured to receive an electrical voltage relative to the respective other electrode arrangement. In the region that couples two respectively adjacent electrodes, the mediator layer is subdivided into a plurality of regions (171, . . . ) that are electrically insulated from one another.
A mirror having an optical effective surface and comprising:
Dependencies are inferred from the claim text.