Intermediate product for producing an optical element for a projection exposure apparatus, optical element for a projection exposure apparatus, method for producing an intermediate product, and method for producing an optical element
AssigneeCarl Zeiss SMT GmbH
InventorsSandro HOFFMANN, Christoph SCHMITZ
Life of this patent
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Abstract
An intermediate product for producing an optical element for a projection exposure apparatus (1) has a substrate (20) for specifying a basic topography of an optical surface, wherein a plurality of etchable layers including a layer (22i) to be structured and a contrast layer (23i) are applied to the substrate (20), wherein the layer (22i) to be structured and the contrast layer (23i) have different chemical properties such that a removal of the contrast layer (23i) can be detected in situ.
Claims15
An intermediate product for producing an optical element for a projection exposure apparatus, comprising:
- a substrate for specifying a basic topography of an optical surface, and
- a plurality of etchable layers comprising a layer to be structured and a contrast layer applied to the substrate,
- wherein the layer to be structured and the contrast layer have differing chemical properties such that a removal of the contrast layer can be detected in situ.
An apparatus for producing an optical element for a projection exposure apparatus, comprising:
- a vacuum chamber for receiving an intermediate product for producing an optical element for a projection exposure apparatus,
- a device for structuring the intermediate product in the vacuum chamber, and
- a device for monitoring the structuring of the intermediate product in situ,
- wherein the device for monitoring the structuring of the intermediate product is coupled to and configured to transmit data to the device for structuring the intermediate product in the vacuum chamber.
Dependencies are inferred from the claim text.