Mirror, in particular for a microlithographic projection exposure apparatus

Mirror with an optical effective surface, comprising:

• a mirror substrate;
• a reflection layer stack configured to reflect electromagnetic radiation that is incident on the optical effective surface;
• at least one first electrode arrangement;
• at least one second electrode arrangement;
• and
• an actuator layer system situated between the first electrode arrangement and the second electrode arrangement,
• wherein the actuator layer system is arranged between the mirror substrate and the reflection layer stack;
• wherein the actuator layer system comprises a piezoelectric layer and is configured to react to an electrical voltage applied between the first electrode arrangement and the second electrode arrangement with a deformation response characterizing a linear deformation of the actuator layer system in a direction perpendicular to the optical effective surface for a predefined value of the electrical voltage, and
• wherein the deformation response varies locally by at least 20% in a peak-to-valley (PV) value for a predefined electrical voltage that is spatially constant across the piezoelectric layer,
• wherein the piezoelectric layer has a locally varying stoichiometry.

Mirror with an optical effective surface, comprising:

• a mirror substrate;
• a reflection layer stack for reflecting electromagnetic radiation that is incident on the optical effective surface;
• a stack of actuator layer systems each arranged between two respective electrode arrangements, wherein the stack is arranged between the mirror substrate and the reflection layer stack;
• wherein each of the actuator layer systems comprises a piezoelectric layer and is configured to react to an electrical voltage applied between the electrode arrangements with a piezoelectric deformation response characterizing a linear deformation of the respective actuator layer system in a direction perpendicular to the optical effective surface for a predefined value of the electrical voltage;
• and
• wherein mutually different actuator layer systems in the stack induce mutually different deformation modes in a wavefront of light reflected at the mirror.