G05B 2219/45028
Lithography
G05B2219/45028 (Lithography) appears on 85 US grants and 108 published applications in this corpus.
Search patents in G05B- Granted patents
- 85
- Published applications
- 108
- Assignees
- 37
- Inventors
- 231
- Latest grant
- 10 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 1 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 5 |
| 2005 | 4 | 8 |
| 2006 | 3 | 5 |
| 2007 | 4 | 3 |
| 2008 | 3 | 5 |
| 2009 | 1 | 4 |
| 2010 | 5 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 3 |
| 2013 | 1 | 0 |
| 2014 | 2 | 1 |
| 2015 | 1 | 3 |
| 2016 | 0 | 2 |
| 2017 | 3 | 1 |
| 2018 | 0 | 4 |
| 2019 | 2 | 9 |
| 2020 | 4 | 8 |
| 2021 | 11 | 14 |
| 2022 | 6 | 8 |
| 2023 | 13 | 12 |
| 2024 | 10 | 3 |
| 2025 | 7 | 6 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Lithography model generating method based on deep learning, and mask manufacturing method including the lithography model generating method10 Mar 2026US 12,572,129 B2Samsung Electronics Co., Ltd.
- Determining a correction to a process9 Dec 2025US 12,493,285 B2ASML Netherlands B. V.
- Lithography device, lithography method, and article manufacturing method7 Oct 2025US 12,436,474 B2Canon Kabushiki Kaisha
- Semiconductor wafer cooling22 Apr 2025US 12,282,318 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Matching process controllers for improved matching of process1 Apr 2025US 12,265,380 B2APPLIED Materials.Inc.
- Determining a correction to a process23 Apr 2026US 2026/0111016 A1ASML Netherlands B. V.
- Method of manufacturing integrated circuit (ic) device having stand-alone feed-through via and system for same5 Feb 2026US 2026/0036970 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Mechatronic system control method, lithographic apparatus control method and lithographic apparatus6 Nov 2025US 2025/0341811 A1ASML Netherlands B. V.
- Method for determining a failure event on a lithography system and associated failure detection module2 Oct 2025US 2025/0306472 A1ASML Netherlands B. V.
- Semiconductor wafer cooling3 Jul 2025US 2025/0216841 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Alignment system and method of alignment by symmetrical and asymmetrical analysis32US 5,355,306 AMotorola, Inc. · 1994
- High precision three-dimensional alignment system for lithography, fabrication and inspection18US 6,181,097 B2Institute of Materials Research and Engineering · 2001
- Command trajectory for driving a stage with minimal vibration16US 6,320,345 B1Nikon Corporation · 2001
- Method for autonomic control of a manufacturing system13US 7,151,972 B2International Business Machines Corporation · 2006
- Method for autonomic control of a manufacturing system9US 7,653,451 B2International Business Machines Corporation · 2010