Determining a correction to a process
AssigneeASML Netherlands B.V.
InventorsSarathi ROY, Edo Maria HULSEBOS, Roy WERKMAN, Junru RUAN
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Abstract
A method for configuring a semiconductor manufacturing process, the method including: obtaining a first value of a first parameter based on measurements associated with a first operation of a process step in the semiconductor manufacturing process and a first sampling scheme; using a recurrent neural network to determine a predicted value of the first parameter based on the first value; and using the predicted value of the first parameter in configuring a subsequent operation of the process step in the semiconductor manufacturing process.
Claims15
A method for configuring a semiconductor manufacturing process, the method comprising:
- obtaining a first value of a first parameter based on measurements associated with a first operation of a process step in the semiconductor manufacturing process and a first sampling scheme;
- using a recurrent neural network to determine a predicted value of the first parameter based on the first value;
- and
- using the predicted value of the first parameter in configuring a subsequent operation of the process step in the semiconductor manufacturing process.
Dependencies are inferred from the claim text.