G03F 1/88
Prepared by photographic processes for production of originals simulating relief
Official title: prepared by photographic processes for production of originals simulating relief
G03F1/88 (Prepared by photographic processes for production of originals simulating relief) appears on 14 US grants and 10 published applications in this corpus.
Search patents in G03F- Granted patents
- 14
- Published applications
- 10
- Assignees
- 11
- Inventors
- 33
- Latest grant
- 8 Sep 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 1 |
| 2013 | 2 | 1 |
| 2014 | 1 | 2 |
| 2015 | 1 | 1 |
| 2016 | 0 | 0 |
| 2017 | 1 | 2 |
| 2018 | 2 | 1 |
| 2019 | 1 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Mask element precursor and relief image-forming system8 Sep 2020US 10,768,520 B2Miraclon Corporation
- Scanning exposure device5 Nov 2019US 10,469,692 B2Sharp Kabushiki Kaisha
- Semiconductor structure25 Dec 2018US 10,163,787 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Manufacturing method of color resist layer20 Feb 2018US 9,897,848 B2Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Semiconductor structure having a plurality of conductive paths4 Jul 2017US 9,698,099 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Manufacturing method of flexographic printing plate7 Dec 2023US 2023/0393480 A1FujifilmCorporation
- Mask element precursor and relief image-forming system22 Aug 2019US 2019/0258152 A1Miraclon Corporation
- Scanning exposure device8 Feb 2018US 2018/0041656 A1Sharp Kabushiki Kaisha
- Manufacturing method of color resist layer28 Dec 2017US 2017/0371200 A1Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Semiconductor structure19 Oct 2017US 2017/0300611 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method and apparatus for enhanced optical proximity correction29US 8,589,830 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2013
- Method of and apparatus for manipulating line weight in an image11US 4,105,328 AThe United States of America as represented by the Secretary of the Interior · 1978
- High resolution recording medium and method for producing same10US 4,258,126 ADr. Johannes Heidenhain GmbH · 1981
- Pattern-dependent proximity matching/tuning including light manipulation by projection optics9US 8,560,978 B2ASML Netherlands B. V. · 2013
- Process for making shade relief maps and the map made thereby7US 4,148,580 A1979