G02B 5/1857

Using exposure or etching means

Official title: {using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams}

G02B5/1857 (Using exposure or etching means) appears on 861 US grants and 972 published applications in this corpus.

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Granted patents
861
Published applications
972
Assignees
452
Inventors
1,912
Latest grant
6 Oct 2026

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G02B 5/1857: granted patents and published applications per publication year
YearGranted patentsPublished applications
197610
197730
197840
197930
198000
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198280
198350
198410
198500
198620
198750
198860
198990
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199190
199240
199350
199450
199570
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199760
1998120
1999100
200060
20011010
20021112
20031519
20041733
20051836
20062330
20071121
20081319
2009923
20101019
20112420
20121923
20131219
20142123
2015925
20162428
20172130
20182340
20194258
20206297
20216683
20226278
20236471
20246461
20254952
20264342

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