Back to results
US 2026/0276873 A1Published application
Field etch to enhance image sharpness of augmented reality waveguide combiners
AssigneeApplied Materials, Inc.
InventorsKunal SHASTRI, David Alexander SELL, Samarth BHARGAVA
Life of this patent
Estimating the term…
Abstract
The present disclosure provides waveguides and methods of forming thereof. The waveguides include a plurality of gratings. The plurality of gratings include grating structures disposed over a waveguide substrate. The grating structures include a grating depth. A waveguide layer is disposed over the waveguide substrate between each of the plurality of gratings and an edge of the waveguide substrate. The waveguide layer has an etch depth. The etch depth is less than the grating depth.
Claims20
A waveguide, comprising:
- a plurality of gratings, the plurality of gratings comprising grating structures disposed over a waveguide substrate, the grating structures comprising a grating depth;
- and
- a waveguide layer disposed over the waveguide substrate between each of the plurality of gratings and an edge of the waveguide substrate, the waveguide layer having an etch depth, the etch depth is less than the grating depth.
A waveguide, comprising:
- a plurality of gratings, the plurality of gratings comprising grating structures disposed over a waveguide substrate, the grating structures comprising a grating depth;
- and
- a waveguide layer disposed over the waveguide substrate between each of the plurality of gratings and an edge of the waveguide substrate, the waveguide layer comprising:
- a first sub-layer disposed over the waveguide substrate;
- and
- a second sub-layer disposed over the first sub-layer,
- wherein the waveguide layer comprises an etch depth from a top surface of the second sub-layer to the top surface of the grating structures.
4 more elements
A method for forming a waveguide, comprising:
- determining an etch depth for etching a waveguide layer of a waveguide, the waveguide layer comprising a first sub-layer and a second sub-layer, wherein the etch depth is less than a grating depth of a plurality of gratings of the waveguide;
- and
- etching the second sub-layer to the etch depth.
Dependencies are inferred from the claim text.