Solid-state imaging element and method of manufacturing the same
AssigneeToppan Holdings Inc.
InventorsRyoma MOTEGI, Jin KITAZAKI
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Abstract
Disclosed is a solid-state imaging element in which a diffraction grating pattern is formed with high shape accuracy on a lens array and a method of manufacturing the solid-state imaging element. The solid-state imaging element o includes a lens array, a planarization layer, and a diffraction grating section. The lens array includes a plurality of microlenses arranged in a regular manner. The planarization layer is formed on the lens array. The diffraction grating section includes a thermosetting resin. The diffraction grating section includes a plurality of diffraction gratings and is provided on the planarization layer. An angle between a lower surface and a side surface of each diffraction grating is 80° or more and 100° or less.
Claims19
A solid-state imaging element comprising:
- a lens array including a plurality of microlenses arranged in a regular manner;
- a planarization layer formed on the lens array;
- and
- a diffraction grating section including a thermosetting resin, the diffraction grating section including a plurality of diffraction gratings and being provided on the planarization layer, wherein
- an angle between a lower surface and a side surface of each diffraction grating is 80° or more and 100° or less.
A solid-state imaging element comprising:
- a lens array including a plurality of microlenses arranged in a regular manner;
- a planarization layer formed on the lens array;
- and
- a diffraction grating section including a thermosetting resin, the diffraction grating section including a base covering an upper surface of the planarization layer and a plurality of diffraction gratings protruding from the base, wherein
- the base between the diffraction gratings has a surface roughness Ra of 100 Å or less.
A method of manufacturing a solid-state imaging element, comprising:
- (A) forming a planarization layer on a lens array including a plurality of microlenses arranged in a regular manner and forming a thermosetting resin layer on the planarization layer;
- (B) forming a sacrificial pattern on the thermosetting resin layer, the sacrificial pattern corresponding to a diffraction grating;
- (C) forming a plurality of diffraction gratings by performing dry etching and transferring a shape of the sacrificial pattern on the thermosetting resin layer, wherein
- said forming (C) includes adjusting an angle between a lower surface and a side surface of each diffraction grating to be 80° or more and 110° or less.
A method of manufacturing the solid-state imaging element, comprising:
- (A) forming a planarization layer on a lens array including a plurality of microlenses arranged in a regular manner and forming a thermosetting resin layer on the planarization layer;
- (B) forming a sacrificial pattern on the thermosetting resin layer, the sacrificial pattern corresponding to a diffraction grating;
- and
- (C) forming a plurality of diffraction gratings by performing dry etching and transferring a shape of the sacrificial pattern on the thermosetting resin layer, wherein
- said forming (C) includes leaving part of the thermosetting resin layer between the diffraction gratings, the part of the thermosetting resin layer having a surface roughness Ra of 100 Å or less.
Dependencies are inferred from the claim text.