G01N 21/9503
Wafer edge inspection
Official title: {Wafer edge inspection}
G01N21/9503 (Wafer edge inspection) appears on 237 US grants and 277 published applications in this corpus.
Search patents in G01N- Granted patents
- 237
- Published applications
- 277
- Assignees
- 130
- Inventors
- 601
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 3 | 3 |
| 2002 | 3 | 11 |
| 2003 | 6 | 8 |
| 2004 | 7 | 8 |
| 2005 | 9 | 13 |
| 2006 | 9 | 13 |
| 2007 | 15 | 12 |
| 2008 | 9 | 17 |
| 2009 | 13 | 22 |
| 2010 | 10 | 13 |
| 2011 | 14 | 14 |
| 2012 | 11 | 8 |
| 2013 | 8 | 8 |
| 2014 | 6 | 10 |
| 2015 | 8 | 10 |
| 2016 | 3 | 4 |
| 2017 | 10 | 5 |
| 2018 | 4 | 6 |
| 2019 | 9 | 4 |
| 2020 | 6 | 14 |
| 2021 | 10 | 13 |
| 2022 | 9 | 14 |
| 2023 | 15 | 11 |
| 2024 | 12 | 16 |
| 2025 | 9 | 8 |
| 2026 | 8 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Reflecting non-planar surfaces integrated with laser scan for Poseidon tool integration7 Jul 2026US 12,674,765 B2Tokyo Electron Limited
- Edge shape measurement apparatus and method of measuring edge shape9 Jun 2026US 12,650,298 B2Fujikoshi Machinery Corp.
- Apparatus and method for optical inspecting three or more sides of a component21 Apr 2026US 12,607,568 B2Besi Switzerland AG
- Systems, devices, and methods for registering a superstrate of an imprint tool21 Apr 2026US 12,610,784 B2Canon Kabushiki Kaisha
- Method and system of sample edge detection and sample positioning for image inspection apparatus24 Feb 2026US 12,560,556 B2ASML Netherlands B. V.
- Inspection system for edge and bevel inspection of semiconductor structures8 Oct 2026US 2026/0309638 A1Camtek Ltd.
- Multiple Azimuth, Multiple Pass Optical Measurements Of Semiconductor Structures1 Oct 2026US 2026/0298807 A1
- Inspection apparatus and method for inspecting semiconductor device13 Aug 2026US 2026/0235532 A1Kabushiki Kaisha Toshiba
- Method and system for detection of bevel edge2 Jul 2026US 2026/0185948 A1Onto Innovation Inc.
- Substrate Mapping Apparatus And Method Therefor2 Jul 2026US 2026/0190924 A1Brooks Automation US, LLC
Most cited
By later US patents
- Methods and systems for determining a critical dimension and a thin film characteristic of a specimen248US 6,633,831 B2KLA-Tencor Technologies Corporation · 2003
- Particle detector for rough surfaces171US 5,189,481 ATencor Instruments · 1993
- Methods and systems for determining a presence of macro and micro defects on a specimen60US 6,829,559 B2KLA-Tencor Technologies Corporation · 2004
- Apparatus for surface inspections58US 5,377,002 ATet Techno Trust Investment Settlement · 1994
- Methods and systems for determining a composition and a thickness of a specimen49US 7,139,083 B2KLA-Tencor Technologies Corporation · 2006