G01N 2021/9563
And suppressing pattern images
Official title: {and suppressing pattern images}
G01N2021/9563 (And suppressing pattern images) appears on 14 US grants and 10 published applications in this corpus.
Search patents in G01N- Granted patents
- 14
- Published applications
- 10
- Assignees
- 9
- Inventors
- 28
- Latest grant
- 3 Jun 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 1 |
| 2008 | 3 | 0 |
| 2009 | 1 | 2 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 2 | 1 |
| 2014 | 2 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 0 |
| 2025 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- System and method for inspection of multiple features of patterned objects in the manufacture of electrical circuits3 Jun 2025US 12,320,758 B2Orbotech Ltd.
- Apparatus and method for inspecting defect in object surface24 Jun 2014US 8,760,643 B2Hitachi High-Technologies Corporation
- Defect inspection device and defect inspection method21 Jan 2014US 8,634,069 B2Hitachi High-Technologies Corporation
- Apparatus and method for inspecting defect on object surface9 Jul 2013US 8,482,728 B2Hitachi High-Technologies Corporation
- Method and apparatus for inspecting defects9 Apr 2013US 8,416,402 B2Hitachi High-Technologies Corporation
- System and Method for Inspection of Multiple Features of Patterned Objects in the Manufacture of Electrical Circuits1 May 2025US 2025/0137938 A1Orbotech Ltd.
- System and Method for Inspection of Multiple Features of Patterned Objects in the Manufacture of Electrical Circuits6 Apr 2023US 2023/0105983 A1Orbotech Ltd.
- Apparatus and method for inspecting defect in object surface17 Oct 2013US 2013/0269126 A1Hitachi High-Technologies Corporation
- Method and apparatus for inspecting defects20 Sep 2012US 2012/0236296 A1Hitachi High-Technologies Corporation
- Defect inspection device and defect inspection method23 Jun 2011US 2011/0149275 A1Hitachi High-Technologies Corporation
Most cited
By later US patents
- Dark field inspection apparatus and methods32US 7,436,503 B1KLA-Tencor Technologies Corporation · 2008
- Exposure apparatus with foreign particle detector18US 4,676,637 AHitachi, Ltd. · 1987
- All-reflective optical systems for broadband wafer inspection17US 7,351,980 B2KLA-Tencor Technologies Corporation · 2008
- Method and apparatus for light span microscopic dark-field display of objects16US 4,720,191 ACarl-Zeiss-Stiftung · 1988
- Optical inspection method and apparatus utilizing a collection angle design11US 6,628,381 B1APPLIED Materials.Inc. · 2003