System and method for inspection of multiple features of patterned objects in the manufacture of electrical circuits
AssigneeOrbotech Ltd.
InventorsVered Gatt, Itzhak Saki Hakim, Chay Goldenberg, Mordehay Amirim
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Abstract
A method for inspection of multiple features of patterned objects in the manufacture of electrical circuits, the method including performing defect detection on the patterned object, employing an optical defect detection machine (ODDM) and employing the ODDM to measure at least one of spatial coordinates and physical attributes of at least some of the multiple features.
Claims21
A method for inspection of multiple features of patterned objects during manufacturing of electrical circuits, the method comprising:
- performing defect detection on said patterned object, employing an optical defect detection machine (ODDM), wherein the patterned object is a printed circuit board, a flexible printed circuit (FPC), or a flat panel display;
- employing said ODDM to output at least one of spatial coordinates and physical attributes of at least some of said multiple features;
- measuring distortion in measurement of said physical attributes of at least some of said multiple features as a function of a location of at least some of said multiple features in a field of view;
- and
- cropping said field of view to a region having acceptably low distortion.
A system for inspection of multiple features of patterned objects during manufacturing of electrical circuits, the system comprising:
- an inspection subsystem operative to detect defects in said patterned object, wherein the patterned object is a printed circuit board, a flexible printed circuit (FPC), or a flat panel display;
- a physical attribute measurement subsystem operative to output measurements of at least one of physical attributes and spatial coordinates of at least some of said multiple features;
- and
- a workstation configured to measure distortion in measurement of said physical attributes of at least some of said multiple features as a function of a location of at least some of said multiple features in a field of view and crop said field of view to a region having acceptably low distortion.
Dependencies are inferred from the claim text.