G01N 2021/3568
Applied to semiconductors
Official title: {applied to semiconductors, e.g. Silicon}
G01N2021/3568 (Applied to semiconductors) appears on 65 US grants and 74 published applications in this corpus.
Search patents in G01N- Granted patents
- 65
- Published applications
- 74
- Assignees
- 58
- Inventors
- 212
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 2 | 1 |
| 2003 | 0 | 1 |
| 2004 | 0 | 1 |
| 2005 | 1 | 2 |
| 2006 | 3 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 2 |
| 2010 | 1 | 3 |
| 2011 | 0 | 1 |
| 2012 | 0 | 2 |
| 2013 | 1 | 1 |
| 2014 | 0 | 1 |
| 2015 | 2 | 4 |
| 2016 | 5 | 3 |
| 2017 | 1 | 10 |
| 2018 | 8 | 5 |
| 2019 | 6 | 3 |
| 2020 | 2 | 3 |
| 2021 | 2 | 5 |
| 2022 | 4 | 6 |
| 2023 | 6 | 1 |
| 2024 | 3 | 11 |
| 2025 | 3 | 3 |
| 2026 | 5 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Measurement method and substrate processing apparatus25 Aug 2026US 12,716,840 B2Tokyo Electron Limited
- Offset voltage compensation circuit and isolation amplifier device including the same28 Jul 2026US 12,693,162 B2Lite-On Singapore Pte. Ltd.
- Optical sensing module, system and method for operating optical sensing system12 May 2026US 12,624,998 B2Lite-On Singapore Pte. Ltd.
- Optical filter including a high refractive index material7 Apr 2026US 12,595,549 B2Viavi Solutions Inc.
- Method for measuring etching amount, and measurement system therefor10 Mar 2026US 12,571,626 B2Kwansei Gakuin Educational Foundation
- Determination method, storage medium, substrate processing apparatus, and information processing apparatus16 Jul 2026US 2026/0202333 A1Tokyo Electron Limited
- Feature Prediction Using Nondestructive Workpiece Imaging25 Jun 2026US 2026/0177500 A1Wolfspeed, Inc.
- Inspection device and microprobe used therein12 Feb 2026US 2026/0043751 A1Samsung Electronics Co., Ltd.
- Measuring apparatus, measuring method, and measuring program1 Jan 2026US 2026/0002871 A1Kioxia Corporation
- Substrate evaluation method and substrate processing apparatus10 Jul 2025US 2025/0224329 A1Tokyo Electron Limited
Most cited
By later US patents
- Method of mapping ion implant dose uniformity40US 4,807,994 AVarian Associates, Inc. · 1989
- Method and apparatus for measuring the composition and other properties of thin films utilizing infrared radiation34US 6,485,872 B1MKS Instruments, Inc. · 2002
- Plasmonic nanophotonics methods, materials, and apparatuses29US 6,977,767 B2Arrowhead Center, Inc. · 2005
- Method and apparatus for measuring spectroscopic absorbance29US 7,767,969 B2Sumco Techxiv Corporation · 2010
- Reflection technique for thermal mapping of semiconductors23US 4,841,150 AThe United States of America as represented by the Secretary of the Air Force · 1989