C23C 18/1287
With flow inducing means
Official title: {with flow inducing means, e.g. ultrasonic}
C23C18/1287 (With flow inducing means) appears on 39 US grants and 46 published applications in this corpus.
Search patents in C23C- Granted patents
- 39
- Published applications
- 46
- Assignees
- 37
- Inventors
- 112
- Latest grant
- 27 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 2 |
| 2003 | 0 | 0 |
| 2004 | 1 | 2 |
| 2005 | 0 | 1 |
| 2006 | 1 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 4 |
| 2009 | 0 | 2 |
| 2010 | 2 | 3 |
| 2011 | 0 | 6 |
| 2012 | 0 | 2 |
| 2013 | 3 | 2 |
| 2014 | 3 | 2 |
| 2015 | 3 | 2 |
| 2016 | 1 | 3 |
| 2017 | 1 | 1 |
| 2018 | 2 | 1 |
| 2019 | 3 | 3 |
| 2020 | 0 | 2 |
| 2021 | 2 | 3 |
| 2022 | 0 | 1 |
| 2023 | 2 | 0 |
| 2024 | 1 | 2 |
| 2025 | 1 | 0 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Depositing of material by spraying precursor using supercritical fluid27 Jan 2026US 12,533,707 B2Nova Engineering Films, Inc.
- Semiconductor tool having controllable ambient environment processing zones26 Aug 2025US 12,398,468 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Depositing of material by spraying precursor using supercritical fluid9 Jan 2024US 11,865,572 B2Nova Engineering Films, Inc.
- Semiconductor tool having controllable ambient environment processing zones14 Nov 2023US 11,814,731 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Perhydropolysilazane compositions and methods for forming oxide films using same29 Aug 2023US 11,739,220 B2American Air Liquide, Inc.
- Depositing of material by spraying precursor using supercritical fluid7 May 2026US 2026/0124639 A1Nova Engineering Films, Inc.
- Depositing of material by spraying precursor using supercritical fluid11 Apr 2024US 2024/0116074 A1Nova Engineering Films, Inc.
- Semiconductor tool having controllable ambient environment processing zones18 Jan 2024US 2024/0018661 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Adhesion promoting layer, method for depositing conductive layer on inorganic or organic-inorganic hybrid substrate, and conductive structure9 Jun 2022US 2022/0177364 A1Industrial Technology Research Institute
- Semiconductor tool having controllable ambient environment processing zones16 Sep 2021US 2021/0285107 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method and apparatus for material deposition120US 5,456,945 ASymetrix Corporation · 1995
- Method of fabricating barium strontium titanate107US 5,614,252 ASymetrix Corporation · 1997
- Misted deposition apparatus for fabricating an integrated circuit91US 5,540,772 ASymetrix Corporation · 1996
- Method and apparatus for fabricating silicon dioxide and silicon glass layers in integrated circuits89US 5,759,923 AMatsushita Electronics Corporation · 1998
- Misted precursor deposition apparatus and method with improved mist and mist flow54US 5,962,085 AMatsushita Electronics Corporation · 1999