C08F 220/382
And containing oxygen
Official title: {and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate}
C08F220/382 (And containing oxygen) appears on 257 US grants and 338 published applications in this corpus.
Search patents in C08F- Granted patents
- 257
- Published applications
- 338
- Assignees
- 118
- Inventors
- 636
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 1 |
| 2003 | 3 | 0 |
| 2004 | 1 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 1 | 4 |
| 2008 | 1 | 10 |
| 2009 | 3 | 11 |
| 2010 | 3 | 11 |
| 2011 | 9 | 24 |
| 2012 | 11 | 21 |
| 2013 | 15 | 15 |
| 2014 | 23 | 17 |
| 2015 | 20 | 10 |
| 2016 | 16 | 18 |
| 2017 | 14 | 27 |
| 2018 | 21 | 22 |
| 2019 | 12 | 23 |
| 2020 | 16 | 26 |
| 2021 | 17 | 16 |
| 2022 | 19 | 18 |
| 2023 | 13 | 23 |
| 2024 | 16 | 21 |
| 2025 | 12 | 15 |
| 2026 | 4 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Composition, transfer film, manufacturing method for laminate, manufacturing method for circuit wire, and manufacturing method for electronic device25 Aug 2026US 12,715,990 B2FUJIFILM Corporation
- Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device31 Mar 2026US 12,590,173 B2Kioxia Corporation
- Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound24 Feb 2026US 12,560,866 B2Jsr Corporation
- Resist composition and patterning process11 Nov 2025US 12,468,224 B2Shin-Etsu Chemical Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
- Reactive gel material for sustained water-based reactions19 Feb 2026US 2026/0049219 A1Everbond Interface Technologies, Inc.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process12 Feb 2026US 2026/0042875 A1Shin-Etsu Chemical Co., Ltd.
- Complex, inorganic photoresist composition comprising the same, and manufacturing method of semiconductor device using the same4 Dec 2025US 2025/0370334 A1Samsung Electronics Co., Ltd.
- Curable composition, cured layer using the composition, color filter including the cured layer and display device including the color filter2 Oct 2025US 2025/0304733 A1Samsung SDI.Co., Ltd.
Most cited
By later US patents
- Water-swellable copolymers and articles and coatings made therefrom1,443US 7,935,773 B2Tyco Healthcare Group LP · 2011
- Polymer particles98US 9,546,236 B2Terumo Kabushiki Kaisha · 2017
- Polymer particles96US 9,803,043 B2Terumo Kabushiki Kaisha · 2017
- Polymer particles95US 9,688,788 B2Terumo Kabushiki Kaisha · 2017
- Method for producing an optical material having a high refractive index65US 5,424,339 AMitsubishi Petrochemical Co., Ltd. · 1995