C08F 220/38
Esters containing sulfur
C08F220/38 (Esters containing sulfur) appears on 479 US grants and 608 published applications in this corpus.
Search patents in C08F- Granted patents
- 479
- Published applications
- 608
- Assignees
- 207
- Inventors
- 1,278
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 6 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 3 | 0 |
| 2000 | 3 | 0 |
| 2001 | 1 | 1 |
| 2002 | 3 | 2 |
| 2003 | 5 | 5 |
| 2004 | 3 | 2 |
| 2005 | 2 | 6 |
| 2006 | 4 | 6 |
| 2007 | 4 | 9 |
| 2008 | 4 | 18 |
| 2009 | 6 | 17 |
| 2010 | 12 | 25 |
| 2011 | 15 | 33 |
| 2012 | 16 | 30 |
| 2013 | 22 | 23 |
| 2014 | 36 | 34 |
| 2015 | 27 | 22 |
| 2016 | 31 | 29 |
| 2017 | 24 | 37 |
| 2018 | 31 | 42 |
| 2019 | 20 | 35 |
| 2020 | 29 | 44 |
| 2021 | 28 | 31 |
| 2022 | 33 | 38 |
| 2023 | 20 | 43 |
| 2024 | 34 | 33 |
| 2025 | 21 | 29 |
| 2026 | 16 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Polymer and preparation thereof, and electrolyte film and preparation thereof22 Sep 2026US 12,744,245 B2Contemporary Amperex Technology (Hong Kong) Limited
- Bio-electrode and method for manufacturing bio-electrode25 Aug 2026US 12,714,346 B2Shin-Etsu Chemical Co., Ltd.
- Composition, transfer film, manufacturing method for laminate, manufacturing method for circuit wire, and manufacturing method for electronic device25 Aug 2026US 12,715,990 B2FUJIFILM Corporation
- Compound, polymerizable composition, polymer, holographic recording medium, optical material, and optical component25 Aug 2026US 12,717,227 B2Mitsubishi Chemical Corporation
- Flame retardant chemical compositions28 Jul 2026US 12,692,360 B2Nordtreat Oy
- Radiation-sensitive composition, resist pattern formation method, polymer, and compound17 Sep 2026US 2026/0277103 A1Jsr Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device30 Jul 2026US 2026/0219576 A1FUJIFILM Corporation
- Composition comprising an aqueous polymer dispersion and a hydraulic binder23 Jul 2026US 2026/0209118 A1Arkema France
- Cured film, optical film, and image display device16 Jul 2026US 2026/0202596 A1FUJIFILM Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
Most cited
By later US patents
- Water-swellable copolymers and articles and coatings made therefrom1,443US 7,935,773 B2Tyco Healthcare Group LP · 2011
- Supports useful for molecular imprinting technology247US 5,959,050 A1999
- Fluorochemical sulfonamide surfactants130US 6,664,354 B23M Innovative Properties Company · 2003
- Polymer particles98US 9,546,236 B2Terumo Kabushiki Kaisha · 2017
- Molecularly imprinted beaded polymers and stabilized suspension polymerization of the same in perfluorocarbon liquids96US 5,872,198 A1999