Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorJun Hatakeyama
Life of this patent
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Abstract
A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
Claims12
A resist composition comprising a base polymer and a quencher,
- said quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodine or bromine-substituted hydrocarbyl group, exclusive of iodine or bromine-substituted aromatic ring, bonded to the nitrogen atom via an ester bond-containing group and at least one compound selected from a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound, and fluorinated imide compound.
Dependencies are inferred from the claim text.