Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound
AssigneeJsr Corporation
InventorsRyuichi Nemoto, Ryotaro Tanaka, Taiichi Furukawa, Katsuaki Nishikori, Hiromitsu Nakashima
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Abstract
A radiation-sensitive resin composition includes: a first polymer including a structural unit including an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), A represents an oxygen atom or a sulfur atom; a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2; X represents a single bond or a divalent organic group having 1 to 20 carbon atoms; and R1 represents a monovalent organic group including a fluorine atom.
Claims18
A radiation-sensitive resin composition comprising:
- a first polymer comprising a structural unit comprising an acid-labile group;
- a second polymer comprising a structural unit represented by formula (1);
- and
- a radiation-sensitive acid generator,
- wherein, in the formula (1), A represents an oxygen atom or a sulfur atom;
- a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2;
- X represents a single bond or a divalent organic group having 1 to 20 carbon atoms;
- and R1 represents a monovalent organic group comprising a fluorine atom.
A polymer comprising a structural unit represented by formula (1):
- wherein, in the formula (1), A represents an oxygen atom or a sulfur atom;
- a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2;
- X represents a single bond or a divalent organic group having 1 to 20 carbon atoms;
- and R1 represents a monovalent organic group comprising a fluorine atom.
A compound represented by formula (i):
- wherein, in the formula (i), A represents an oxygen atom or a sulfur atom;
- a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2;
- X represents a single bond or a divalent organic group having 1 to 20 carbon atoms;
- and R1 represents a monovalent organic group comprising a fluorine atom.
Dependencies are inferred from the claim text.