C08F 212/22
Oxygen
Official title: {Oxygen}
C08F212/22 (Oxygen) appears on 470 US grants and 665 published applications in this corpus.
Search patents in C08F- Granted patents
- 470
- Published applications
- 665
- Assignees
- 198
- Inventors
- 1,204
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 3 | 0 |
| 1988 | 3 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 7 | 0 |
| 1999 | 5 | 0 |
| 2000 | 5 | 0 |
| 2001 | 7 | 2 |
| 2002 | 3 | 11 |
| 2003 | 5 | 7 |
| 2004 | 6 | 7 |
| 2005 | 4 | 2 |
| 2006 | 4 | 5 |
| 2007 | 3 | 7 |
| 2008 | 3 | 15 |
| 2009 | 3 | 16 |
| 2010 | 9 | 20 |
| 2011 | 5 | 14 |
| 2012 | 9 | 15 |
| 2013 | 16 | 26 |
| 2014 | 22 | 21 |
| 2015 | 21 | 31 |
| 2016 | 28 | 39 |
| 2017 | 18 | 34 |
| 2018 | 29 | 33 |
| 2019 | 28 | 29 |
| 2020 | 24 | 49 |
| 2021 | 17 | 64 |
| 2022 | 39 | 36 |
| 2023 | 48 | 56 |
| 2024 | 25 | 43 |
| 2025 | 30 | 48 |
| 2026 | 15 | 35 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Resist underlayer compositions and pattern formation methods using such compositions11 Aug 2026US 12,704,778 B2Dupont Electronic Materials International, LLC
- Resist material and patterning process11 Aug 2026US 12,704,780 B2Shin-Etsu Chemical Co., Ltd.
- Additives for electrolyte and cathode material in Li-ion batteries comprising metal-based cathode material which produces M2+ metal ions11 Aug 2026US 12,706,324 B2Hydro-Quebec
- Polymer, photoresist compositions including the same, and pattern formation methods7 Jul 2026US 12,675,045 B2Dupont Electronic Materials International, LLC
- Resin composition and film16 Jun 2026US 12,655,277 B2Toppan Inc.
- Radiation-sensitive composition, resist pattern formation method, polymer, and compound17 Sep 2026US 2026/0277103 A1Jsr Corporation
- Resist composition and method for forming resist pattern10 Sep 2026US 2026/0267225 A1Tokyo Ohka Kogyo.Co., Ltd.
- Composition, resin composition, composition for film formation, pattern formation method, and compound3 Sep 2026US 2026/0259493 A1Mitsubishi Gas Chemical Company, Inc.
- Radiation-sensitive composition, method for forming pattern, polymer, and compound3 Sep 2026US 2026/0259498 A1Jsr Corporation
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process20 Aug 2026US 2026/0242334 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Functionalized vinyl polymer nanoparticles60US 8,883,929 B2Compagnie Generale des Etablissements · 2014
- Polymer for use as protective layers and other components in electrochemical cells50US 10,020,512 B2BASF SE · 2018
- Copolymers and photoresist compositions comprising copolymer resin binder component49US 6,042,997 AIBM Corporation · 2000
- Copolymers and photoresist compositions comprising copolymer resin binder component41US 5,861,231 AIBM Corporation · 1999
- Copolymers crosslinkable by acid catalysis39US 5,274,060 ACiba-Geigy Corporation · 1993