C08F 212/14
Substituted by heteroatoms or groups containing heteroatoms
Official title: substituted by heteroatoms or groups containing heteroatoms
C08F212/14 (Substituted by heteroatoms or groups containing heteroatoms) appears on 813 US grants and 1,047 published applications in this corpus.
Search patents in C08F- Granted patents
- 813
- Published applications
- 1,047
- Assignees
- 397
- Inventors
- 2,173
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 3 | 0 |
| 1978 | 4 | 0 |
| 1979 | 1 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 3 | 0 |
| 1983 | 4 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 7 | 0 |
| 1987 | 13 | 0 |
| 1988 | 8 | 0 |
| 1989 | 4 | 0 |
| 1990 | 5 | 0 |
| 1991 | 6 | 0 |
| 1992 | 8 | 0 |
| 1993 | 8 | 0 |
| 1994 | 5 | 0 |
| 1995 | 11 | 0 |
| 1996 | 7 | 0 |
| 1997 | 6 | 0 |
| 1998 | 11 | 0 |
| 1999 | 11 | 0 |
| 2000 | 5 | 0 |
| 2001 | 12 | 5 |
| 2002 | 14 | 17 |
| 2003 | 6 | 10 |
| 2004 | 9 | 11 |
| 2005 | 5 | 8 |
| 2006 | 7 | 12 |
| 2007 | 6 | 14 |
| 2008 | 7 | 22 |
| 2009 | 6 | 21 |
| 2010 | 11 | 29 |
| 2011 | 6 | 19 |
| 2012 | 12 | 23 |
| 2013 | 21 | 34 |
| 2014 | 28 | 41 |
| 2015 | 33 | 45 |
| 2016 | 45 | 58 |
| 2017 | 38 | 59 |
| 2018 | 54 | 50 |
| 2019 | 42 | 56 |
| 2020 | 39 | 78 |
| 2021 | 35 | 87 |
| 2022 | 55 | 68 |
| 2023 | 63 | 78 |
| 2024 | 47 | 70 |
| 2025 | 48 | 76 |
| 2026 | 26 | 56 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Resist underlayer compositions and pattern formation methods using such compositions11 Aug 2026US 12,704,778 B2Dupont Electronic Materials International, LLC
- Resist material and patterning process11 Aug 2026US 12,704,780 B2Shin-Etsu Chemical Co., Ltd.
- Additives for electrolyte and cathode material in Li-ion batteries comprising metal-based cathode material which produces M2+ metal ions11 Aug 2026US 12,706,324 B2Hydro-Quebec
- Polymer, photoresist compositions including the same, and pattern formation methods7 Jul 2026US 12,675,045 B2Dupont Electronic Materials International, LLC
- Resin composition and film16 Jun 2026US 12,655,277 B2Toppan Inc.
- Polymerizable composition, ion exchange resin, ion exchange membrane, membrane electrode assembly, and hydrogen production device8 Oct 2026US 2026/0308295 A1Tokuyama Corporation
- Radiation-sensitive composition, resist pattern formation method, polymer, and compound17 Sep 2026US 2026/0277103 A1Jsr Corporation
- Polyelectrolyte membrane having, as base therefor, polymer having high density of acidic functional groups10 Sep 2026US 2026/0265431 A1National University Corporation Tokai National Higher Education and Research System
- Resist composition and method for forming resist pattern10 Sep 2026US 2026/0267225 A1Tokyo Ohka Kogyo.Co., Ltd.
- Composition, resin composition, composition for film formation, pattern formation method, and compound3 Sep 2026US 2026/0259493 A1Mitsubishi Gas Chemical Company, Inc.
Most cited
By later US patents
- Contact lens material84US 6,420,453 B1Biocompatibles Limited · 2002
- Contact lens material62US 6,423,761 B1Biocompatibles Limited · 2002
- Functionalized vinyl polymer nanoparticles60US 8,883,929 B2Compagnie Generale des Etablissements · 2014
- Trifluorostyrene and substituted trifluorostyrene copolymeric compositions and ion-exchange membranes formed therefrom56US 5,422,411 ABallard Power Systems Inc. · 1995
- Polymer for use as protective layers and other components in electrochemical cells50US 10,020,512 B2BASF SE · 2018