C08F 212/30
Sulfur
Official title: {Sulfur}
C08F212/30 (Sulfur) appears on 198 US grants and 232 published applications in this corpus.
Search patents in C08F- Granted patents
- 198
- Published applications
- 232
- Assignees
- 129
- Inventors
- 554
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 3 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 2 |
| 2002 | 5 | 1 |
| 2003 | 1 | 2 |
| 2004 | 1 | 0 |
| 2005 | 0 | 3 |
| 2006 | 1 | 5 |
| 2007 | 0 | 3 |
| 2008 | 2 | 4 |
| 2009 | 3 | 3 |
| 2010 | 0 | 9 |
| 2011 | 1 | 4 |
| 2012 | 3 | 3 |
| 2013 | 3 | 6 |
| 2014 | 7 | 19 |
| 2015 | 11 | 17 |
| 2016 | 13 | 13 |
| 2017 | 18 | 16 |
| 2018 | 19 | 12 |
| 2019 | 4 | 11 |
| 2020 | 13 | 16 |
| 2021 | 11 | 13 |
| 2022 | 10 | 19 |
| 2023 | 9 | 18 |
| 2024 | 12 | 14 |
| 2025 | 11 | 13 |
| 2026 | 4 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photosensitive polymer, photoresist composition including the same, and method of fabricating semiconductor device28 Apr 2026US 12,613,467 B2Samsung Electronics Co., Ltd.
- Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device31 Mar 2026US 12,590,173 B2Kioxia Corporation
- Compositions and polymer films27 Jan 2026US 12,534,583 B2FUJIFILM Corporation
- Polystyrene-based polyampholyte having upper critical solution temperature, and application for same6 Jan 2026US 12,516,143 B2Tosoh Finechem Corporation
- Proton conductive material2 Dec 2025US 12,486,399 B2National University Corporation Hokkaido University
- Polyelectrolyte membrane having, as base therefor, polymer having high density of acidic functional groups10 Sep 2026US 2026/0265431 A1National University Corporation Tokai National Higher Education and Research System
- Optical product26 Mar 2026US 2026/0085194 A1Tokyo Ohka Kogyo.Co., Ltd.
- Polymer electrolyte, secondary battery and electrical device5 Mar 2026US 2026/0066344 A1AESC Japan Ltd.
- Onium salt, chemically amplified resist composition, and pattern forming process12 Feb 2026US 2026/0044075 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt type monomer, polymer, chemically amplified resist composition, and pattern forming process12 Feb 2026US 2026/0044076 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Trifluorostyrene and substituted trifluorostyrene copolymeric compositions and ion-exchange membranes formed therefrom56US 5,422,411 ABallard Power Systems Inc. · 1995
- Polymer for use as protective layers and other components in electrochemical cells50US 10,020,512 B2BASF SE · 2018
- Films and absorbent articles made from copolymers having a copolymerized crosslinker35US 4,071,650 AThe Dow Chemical Company · 1978
- Polymer having sulfonic acid group or sulfonic acid ester group and amide group, and toner for developing electrostatic latent image having the polymer34US 7,935,771 B2Canon Kabushiki Kaisha · 2011
- Substituted .alpha.,.beta.,.beta.-trifluorostyrene-based composite membranes31US 5,834,523 ABallard Power Systems Inc. · 1998