Back to results
US 12,613,467 B2Granted
Photosensitive polymer, photoresist composition including the same, and method of fabricating semiconductor device
AssigneeSamsung Electronics Co., Ltd.
InventorsSung Hwan Park, Juhyeon Park, Hyunwoo Kim, Suk Koo Hong
Life of this patent
Estimating the term…
Abstract
An extreme ultraviolet (EUV) photosensitive polymer includes a first repeating unit represented by Chemical Formula 1. (in Chemical Formula 1, R1 is a C1 to C10 alkyl group, a C1 to C10 haloalkyl group, a C6 to C18 aryl group, a haloaryl group, a C7 to C18 arylalkyl group, a C7 to C18 alkylaryl group, or a C6 to C18 haloaryl group, and R2 is a direct bond, a C1 to C10 alkylene group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C6 to C18 aryl group, a C7 to C18 arylalkyl group, or a C7 to C18 alkylaryl group).
Claims14
An extreme ultraviolet (EUV) photosensitive polymer comprising:
- a first repeating unit represented by Chemical Formula 1:
- wherein, in Chemical Formula 1, R1 is a C1 to C10 alkyl group, a C1 to C10 haloalkyl group, a C6 to C18 aryl group, a haloaryl group, a C7 to C18 arylalkyl group, a C7 to C18 alkylaryl group, or a C6 to C18 haloaryl group,
- R2 is a direct bond, a C1 to C10 alkylene group, a C1 to C10 haloalkylene group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C6 to C18 aryl group, a C7 to C18 arylalkyl group, or a C7 to C18 alkylaryl group, and
- the first repeating unit is 12% to 32% of a number of total repeating units;
- a second repeating unit represented by Chemical Formula 2:
- wherein, in Chemical Formula 2, R3 is an acid-labile protecting group,
- R4 is a hydrogen atom, a C1 to C6 linear or branched alkyl group, a halogen atom, or a C1 to C6 linear or branched alkyl halide group, and
- the second repeating unit is 25% to 65% of a number of total repeating units;
- and
- a third repeating unit represented by Chemical Formula 3:
- wherein, in Chemical Formula 3, R5 is a hydrogen atom, a hydroxyl group, a carboxyl group, a C1 to C10 alkyl group, a C3 to C12 cycloalkyl group, or a C1 to C10 alkoxy group, and
- R6 is a hydrogen atom, a hydroxyl group, or a carboxyl group, and
- the third repeating unit is 20% to 40% of a number of total repeating units.
10 more elements
A photoresist composition comprising:
- a photosensitive polymer;
- and
- a solvent,
- wherein the photosensitive polymer comprises a first repeating unit represented by Chemical Formula 1:
- wherein, in Chemical Formula 1, R1 is a C1 to C10 alkyl group, a C1 to C10 haloalkyl group, a C6 to C18 aryl group, a haloaryl group, a C7 to C18 arylalkyl group, a C7 to C18 alkylaryl group, or a C6 to C18 haloaryl group,
- R2 is a direct bond, a C1 to C10 alkylene group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C6 to C18 aryl group, a C7 to C18 arylalkyl group, or a C7 to C18 alkylaryl group), and
- the first repeating unit is 12% to 32% of a number of total repeating units
- a second repeating unit represented by Chemical Formula 2:
- wherein, in Chemical Formula 2, R3 is an acid-labile protecting group,
- R4 is a hydrogen atom, a C1 to C6 linear or branched alkyl group, a halogen atom, or a C1 to C6 linear or branched alkyl halide group, and
- the second repeating unit is 25% to 65% of a number of total repeating units;
- and
- a third repeating unit represented by Chemical Formula 3:
- wherein, in Chemical Formula 3, R5 is a hydrogen atom, a hydroxyl group, a carboxyl group, a C1 to C10 alkyl group, a C3 to C12 cycloalkyl group, or a C1 to C10 alkoxy group, and
- R6 is a hydrogen atom, a hydroxyl group, or a carboxyl group, and
- the third repeating unit is 20% to 40% of a number of total repeating units.
13 more elements
A photoresist composition comprising:
- a photosensitive polymer;
- a photoacid generator (PAG);
- a basic quencher;
- and
- a solvent,
- wherein the photosensitive polymer comprises a random copolymer comprising a first repeating unit represented by Chemical Formula 1, a second repeating unit represented by Chemical Formula 2, and a third repeating unit represented by Chemical Formula 3:
- wherein in Chemical Formulae 1 to 3, R1 is a C1 to C10 alkyl group, a C1 to C10 haloalkyl group, a C6 to C18 aryl group, a haloaryl group, a C7 to C18 arylalkyl group, a C7 to C18 alkylaryl group, or a C6 to C18 haloaryl group,
- R2 is a direct bond, a C1 to C10 alkylene group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C6 to C18 aryl group, a C7 to C18 arylalkyl group, or a C7 to C18 alkylaryl group,
- R3 is an acid-labile protecting group,
- R4 is a hydrogen atom, a C1 to C6 linear or branched alkyl group, a halogen atom, or a C1 to C6 linear or branched alkyl halide group,
- R5 is a hydrogen atom, a hydroxyl group, a carboxyl group, a C1 to C10 alkyl group, a C3 to C12 cycloalkyl group, or a C1 to C10 alkoxy group,
- R6 is a hydrogen atom, a hydroxyl group, or a carboxyl group,
- the first repeating unit is 12% to 32% of a total of the first, second, and third repeating units
- the second repeating unit is about 35% to about 65% of the total of the first, second, and
- third repeating units, and the third repeating unit is about 20% to about 40% of the total of the first, second, and third repeating units.
12 more elements
Dependencies are inferred from the claim text.