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US 2026/0044076 A1Published application
Sulfonium salt type monomer, polymer, chemically amplified resist composition, and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorMasahiro Fukushima
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Abstract
The sulfonium salt type monomer has the following formula (A). The sulfonium salt type monomer can be used for a chemically amplified resist composition having excellent solvent solubility, high sensitivity, high contrast, and excellent lithographic performances such as EL, LWR, CDU, and DOF particularly in photolithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, electron beam (EB), and EUV.
Claims15
A sulfonium salt type monomer having the following formula (A):
- wherein p is 1, 2, or 3, n1 is 0 or 1, n2 is 1 or 2, n3 is 0, 1, 2, or 3, provided that, when n1 is 0, 1≤n2+n3≤5, and when n1 is 1, 1≤n2+n3≤7,
- R1 is a halogen atom, a nitro group, a hydroxy group, a carboxy group, a C1-C20 hydrocarbyl group which may contain a heteroatom, a C1-C20 hydrocarbyloxy group which may contain a heteroatom, a C1-C20 hydrocarbylthio group which may contain a heteroatom, or a C2-C20 hydrocarbyloxycarbonyl group which may contain a heteroatom, when n3 is 2 or 3, respective R1 may be the same as or different from each other, and two R′'s may bond together to form a ring with the carbon atom to which they are attached,
- R2 is a halogen atom, or a C1-C30 hydrocarbyl group which may contain a heteroatom, when p is 1, two R2's may be the same as or different from each other, two of three substituents bonded to S+ may bond together to form a ring with the sulfur atom to which they are bonded, and
- Z− is an aromatic sulfonic acid anion having an aromatic vinyl structure.
1 more element
Dependencies are inferred from the claim text.