C07F 9/92
Aromatic compounds
C07F9/92 (Aromatic compounds) appears on 27 US grants and 19 published applications in this corpus.
Search patents in C07F- Granted patents
- 27
- Published applications
- 19
- Assignees
- 18
- Inventors
- 64
- Latest grant
- 20 May 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 1 |
| 2010 | 0 | 1 |
| 2011 | 1 | 1 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 1 |
| 2016 | 0 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 1 | 1 |
| 2022 | 0 | 6 |
| 2023 | 2 | 2 |
| 2024 | 2 | 3 |
| 2025 | 3 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photoacid generator for chemically amplified photoresists for deep ultra violet and extreme ultraviolet lithography20 May 2025US 12,306,535 B2International Business Machines Corporation
- Photoacid generator for chemically amplified photoresists4 Mar 2025US 12,242,190 B2International Business Machines Corporation
- Photoacid generator4 Feb 2025US 12,216,402 B2International Business Machines Corporation
- Organometallic photoresists for DUV or EUV lithography5 Nov 2024US 12,135,503 B2International Business Machines Corporation
- Photoresist for semiconductor fabrication23 Jul 2024US 12,044,966 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Positive-tone organometallic euv resists26 Feb 2026US 2026/0056462 A1The Research Foundation for The State University of New York
- Lithography compositions and methods for forming resist patterns and/or making semiconductor devices30 Jan 2025US 2025/0036023 A1The Research Foundation for The State University of New York
- Photoresist for semiconductor fabrication21 Nov 2024US 2024/0385516 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Organoantimony(v) cyanoximate compounds and methods of production and use thereof30 May 2024US 2024/0172756 A1Missouri State University
- Photoacid generator29 Feb 2024US 2024/0069442 A1International Business Machines Corporation
Most cited
By later US patents
- Organometallic antimony compounds useful in chemical vapor deposition processes50US 4,960,916 AThe United States of America as represented by the Secretary of the Navy · 1990
- Nickel ylides15US 4,293,502 AGulf Research & Development Company · 1981
- Preparation of bidentate ligands12US 4,879,416 AEastman Kodak Company · 1989
- Process for recovering oligomerization product11US 4,301,318 AGulf Research & Development Company · 1981
- Compounds for organic electronic devices10US 8,334,058 B2Merck Patent GmbH · 2012