Organometallic antimony compounds useful in chemical vapor deposition processes

Abstract

Organometallic antimony compounds having increased stability that are use in chemical vapor deposition processes are provided which comprise stibines containing sterically-demanding ligands, stibines lacking beta hydrogen atoms, or aromatic stibines. These compounds will generally have the formula: SbR.sub.n X.sub.3-n wherein R is selected from the group consisting of neopentyl, 2-ethylbutyl, 1-ethylpropyl, perhaloalkanes having 3-5 carbon atoms, benzyl, fluoro-substituted phenyl, cyclopentyl, and pentamethylcyclopentadienyl; X is selected from the group consisting of Br, Cl, I and H; and wherein n is an integer from 1 to 3. These compounds exhibit increased thermal stability and are thus advantageously used as substitutes for arsenic or other group V metals in chemical vapor deposition processes. Because of the bulky ligand group bound to the antimony and/or the lack of beta hydrogen atoms in the ligand, theses organometallic stibines are less prone to decompose prematurely and thus exhibit greater thermal stability than previously known alkyl antimony hydride compounds.

Dependencies are inferred from the claim text.