Photoacid generator for chemically amplified photoresists for deep ultra violet and extreme ultraviolet lithography

A photoresist composition comprising a photoacid generator (PAG), wherein the PAG comprises:

• a PAG anion, the PAG anion comprising:
• a first moiety selected from the group consisting of an alkyl group, a monocyclic aromatic group, and a bicyclic aromatic group, wherein the first moiety comprises a carbon atom with a negative elementary charge;
• an electron acceptor atom selected from the group consisting of boron(III), aluminum(III), and phosphorus(V), wherein the electron acceptor atom is covalently bonded to the carbon atom;
• and
• R groups comprising at least one electron-withdrawing R group;
• and
• a cation selected from the group consisting of triphenylsulfonium, diphenyliodonium, phenylthiolanium, and derivatives thereof.

A method of forming a patterned material feature on a substrate, comprising:

• providing a material surface on the substrate;
• forming a layer of a photoresist composition over the material surface, wherein the photoresist composition comprises a photoacid generator (PAG), comprising:
• a PAG anion, comprising:
• a first moiety selected from the group consisting of an alkyl group, a monocyclic aromatic group, and a bicyclic aromatic group, wherein the first moiety comprises a carbon atom with a negative elementary charge;
• an electron acceptor atom selected from the group consisting of boron(III), aluminum(III), and phosphorus(V), wherein the electron acceptor atom is covalently bonded to the carbon atom;
• and
• R groups, wherein at least one of the R groups comprises an electron withdrawing group;
• and
• a cation selected from the group consisting of triphenylsulfonium, diphenyliodonium, phenylthiolanium, and derivatives thereof;
• irradiating the photoresist layer with an energy ray to form a pattern of radiation-exposed regions in the photoresist layer;
• selectively removing portions of the irradiated photoresist layer to form exposed portions of the material surface;
• and
• etching or ion implanting the exposed portions of the material surface, thereby forming the patterned material feature.