C07C 381/12
Sulfonium compounds
C07C381/12 (Sulfonium compounds) appears on 599 US grants and 693 published applications in this corpus.
Search patents in C07C- Granted patents
- 599
- Published applications
- 693
- Assignees
- 159
- Inventors
- 957
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 3 | 0 |
| 1978 | 6 | 0 |
| 1979 | 3 | 0 |
| 1980 | 5 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 4 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 3 | 0 |
| 1989 | 4 | 0 |
| 1990 | 5 | 0 |
| 1991 | 8 | 0 |
| 1992 | 6 | 0 |
| 1993 | 7 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 10 | 0 |
| 1998 | 14 | 0 |
| 1999 | 3 | 0 |
| 2000 | 6 | 0 |
| 2001 | 1 | 0 |
| 2002 | 7 | 9 |
| 2003 | 7 | 9 |
| 2004 | 4 | 12 |
| 2005 | 11 | 17 |
| 2006 | 7 | 7 |
| 2007 | 12 | 24 |
| 2008 | 12 | 26 |
| 2009 | 19 | 27 |
| 2010 | 21 | 35 |
| 2011 | 21 | 42 |
| 2012 | 28 | 32 |
| 2013 | 30 | 25 |
| 2014 | 29 | 20 |
| 2015 | 40 | 25 |
| 2016 | 33 | 32 |
| 2017 | 23 | 32 |
| 2018 | 25 | 21 |
| 2019 | 23 | 25 |
| 2020 | 15 | 25 |
| 2021 | 13 | 35 |
| 2022 | 22 | 29 |
| 2023 | 30 | 44 |
| 2024 | 18 | 40 |
| 2025 | 18 | 30 |
| 2026 | 19 | 70 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Salt, quencher, resist composition and method for producing resist pattern1 Sep 2026US 12,724,343 B2Sumitomo Chemical Company, Limited
- Salt, acid generator, resist composition and method for producing resist pattern25 Aug 2026US 12,715,843 B2Sumitomo Chemical Company, Limited
- Photoactive compounds, photoresist compositions including the same, and pattern formation methods25 Aug 2026US 12,717,231 B2Dupont Electronic Materials International, LLC
- Salt, acid generator, resist composition and method for producing resist pattern11 Aug 2026US 12,704,781 B2Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound11 Aug 2026US 12,704,782 B2FUJIFILM Corporation
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Salt, acid generator, resin, resist composition, and method for producing resist pattern24 Sep 2026US 2026/0288002 A1Sumitomo Chemical Company, Limited
- Preparation of polymer, preparation of chemically amplified resist composition, resist pattern forming process, polymer, and chemically amplified resist composition3 Sep 2026US 2026/0259497 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process27 Aug 2026US 2026/0250243 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process20 Aug 2026US 2026/0242334 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Photocurable epoxy compositions containing group Va onium salts166US 4,069,055 AGeneral Electric Company · 1978
- Liposomes containing cationic lipids and vitamin D122US 5,851,548 AGen-Probe Incorporated · 1998
- Complex salt photoinitiator90US 4,173,476 AMinnesota Mining and Manufacturing Company · 1979
- Highly packed polycationic ammonium, sulfonium and phosphonium lipids89US 5,674,908 ALife Technologies Corporation · 1997
- Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition83US 6,908,722 B2Jsr Corporation · 2005