US 12,704,782 B2 · Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound

Abstract

An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (I). In General Formula (I), Ra and Rb each independently represent a hydrogen atom or a substituent, provided that Ra and Rb satisfy the following requirement (1) or (2): (1) at least one of Ra or Rb represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, and Ra and Rb may be bonded to each other to form a ring, and (2) Ra and Rb are bonded to each other to form a ring, Rc represents a substituent, L0 represents a single bond or a divalent linking group, L1 represents a single bond or a divalent linking group, L2 represents a single bond or a divalent linking group, nM+ represents an organic cationic moiety, and n represents an integer of 1 or more.

A compound represented by General Formula (IA-1),

wherein a carbon anion group represented by Formula (A) is a group represented by any of General Formulae (a-1), (a-2), and (a-5) to (a-9),
in General Formula (IA-1),
Ra and Rb each independently represent a hydrogen atom or a substituent,
provided that Ra and Rb satisfy the following requirement (1) or (2);
(1) at least one of Ra or Rb represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, and Ra and Rb may be bonded to each other to form a ring, and
(2) Ra and Rb are bonded to each other to form a ring,
Rc represents a substituent,
L01 represents a single bond or a divalent linking group,
L1 represents a single bond or a divalent linking group,
L2 represents a single bond or a divalent linking group,
nM+ represents an organic cationic moiety,
n represents an integer of 1 or more,
Rd's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n1 represents an integer of 1 to 5,
in Formula (A),
* represents a bonding position,
in General Formula (a-1),
R1 and R2 each independently represent a hydrogen atom, a secondary alkyl group, a tertiary alkyl group, or a cycloalkyl group,
provided that R1 and R2 satisfy the following requirement (1A) or (1B):
(1A) at least one of R1 or R2 represents a secondary alkyl group, a tertiary alkyl group, or a cycloalkyl group, and R1 and R2 may be bonded to each other to form a ring, and
(1B) R1 and R2 are bonded to each other to form a ring,
Re1's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n11's each independently represent 0, 1, or 2,
in General Formula (a-2),
R3 and R4 each independently represent a hydrogen atom or a substituent,
provided that R3 and R4 satisfy the following requirement (2A) or (2B):
(2A) At least one of R3 or R4 represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, and R3 and R4 may be bonded to each other to form a ring, and
(2B) R3 and R4 are bonded to each other to form a ring,
Re2's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n12's each independently represent 0, 1, or 2,
in General Formula (a-5),
R9 and R10 each independently represent a hydrogen atom or a substituent, provided that R9 and R10 satisfy the following requirement (5A) or (5B):
(5A) At least one of R9 or R10 represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, and R9 and R10 may be bonded to each other to form a ring, and
(5B) R9 and R10 are bonded to each other to form a ring,
Re5's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n15's each independently represent 0, 1, or 2,
in General Formula (a-6),
R11 and R12 each independently represent a hydrogen atom or a substituent, provided that R11 and R12 satisfy the following requirement (6A) or (6B):
(6A) at least one of R11 or R12 represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, and R11 and R12 may be bonded to each other to form a ring, and
(6B) R11 and R12 are bonded to each other to form a ring,
Re6's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n16's each independently represent 0, 1, or 2,
in General Formula (a-7),
R13 represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group,
Re7's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n17 represents 0, 1, or 2,
in General Formula (a-8),
R14 represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group,
Re8's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n18 represents 0, 1, or 2,
in General Formula (a-9),
R15 represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, Re9's each independently represent a hydrogen atom, a fluorine atom, or an alkyl fluoride group, and
n19 represents 0, 1, or 2, and
in General Formulae (a-1), (a-2), and (a-5) to (a-9),
* represents a bonding position.

52 more elements

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound

Life of this patent

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound

Life of this patent

Abstract

Claims12