C07C 309/42
Having the sulfo groups bound to carbon atoms of non-condensed six-membered aromatic
Official title: having the sulfo groups bound to carbon atoms of non-condensed six-membered aromatic rings
C07C309/42 (Having the sulfo groups bound to carbon atoms of non-condensed six-membered aromatic) appears on 138 US grants and 110 published applications in this corpus.
Search patents in C07C- Granted patents
- 138
- Published applications
- 110
- Assignees
- 86
- Inventors
- 339
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 4 | 0 |
| 1992 | 8 | 0 |
| 1993 | 6 | 0 |
| 1994 | 5 | 0 |
| 1995 | 4 | 0 |
| 1996 | 9 | 0 |
| 1997 | 6 | 0 |
| 1998 | 4 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 4 | 1 |
| 2002 | 2 | 2 |
| 2003 | 3 | 1 |
| 2004 | 1 | 1 |
| 2005 | 2 | 2 |
| 2006 | 1 | 2 |
| 2007 | 0 | 3 |
| 2008 | 1 | 8 |
| 2009 | 1 | 1 |
| 2010 | 4 | 4 |
| 2011 | 0 | 8 |
| 2012 | 2 | 7 |
| 2013 | 8 | 1 |
| 2014 | 3 | 8 |
| 2015 | 7 | 5 |
| 2016 | 6 | 4 |
| 2017 | 6 | 4 |
| 2018 | 2 | 4 |
| 2019 | 3 | 7 |
| 2020 | 4 | 3 |
| 2021 | 4 | 5 |
| 2022 | 1 | 5 |
| 2023 | 6 | 9 |
| 2024 | 5 | 7 |
| 2025 | 2 | 2 |
| 2026 | 2 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device5 May 2026US 12,619,147 B2FUJIFILM Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound17 Feb 2026US 12,554,196 B2FUJIFILM Corporation
- Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device25 Feb 2025US 12,235,579 B2FUJIFILM Corporation
- Gradient membranes formed from free standing structured organic films and methods thereof21 Jan 2025US 12,202,788 B2Xerox Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound10 Dec 2024US 12,164,230 B2FUJIFILM Corporation
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming method30 Jul 2026US 2026/0219570 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition, resist pattern formation method, compound, and acid generator9 Jul 2026US 2026/0194811 A1Tokyo Ohka Kogyo.Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
- Modulators of mas-related g-protein receptor x4 and related products and methods23 Apr 2026US 2026/0108482 A1Escient Pharmaceuticals, Inc.
- Onium salt, chemically amplified positive resist composition and resist pattern forming process26 Mar 2026US 2026/0086459 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Surface coating agents97US 6,278,018 B1SurModics, Inc. · 2001
- Ink compositions58US 5,509,957 ACiba-Geigy Corporation · 1996
- Quaternary ammonium compounds for use in bleaching systems40US 4,904,406 ALever Brothers Company · 1990
- Surface coating agents36US 6,603,040 B1SurModics, Inc. · 2003
- Diphenylheteroalkyl derivatives, the preparation thereof and drugs and cosmetics prepared therefrom32US 5,087,743 ABASF SE · 1992