C01B 32/186
By chemical vapour deposition [cvd]
Official title: by chemical vapour deposition [CVD]
C01B32/186 (By chemical vapour deposition [cvd]) appears on 423 US grants and 610 published applications in this corpus.
Search patents in C01B- Granted patents
- 423
- Published applications
- 610
- Assignees
- 299
- Inventors
- 1,161
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2009 | 0 | 4 |
| 2010 | 0 | 5 |
| 2011 | 3 | 18 |
| 2012 | 5 | 20 |
| 2013 | 9 | 50 |
| 2014 | 21 | 56 |
| 2015 | 24 | 62 |
| 2016 | 40 | 49 |
| 2017 | 34 | 52 |
| 2018 | 42 | 35 |
| 2019 | 38 | 50 |
| 2020 | 45 | 33 |
| 2021 | 27 | 36 |
| 2022 | 28 | 40 |
| 2023 | 29 | 39 |
| 2024 | 33 | 28 |
| 2025 | 25 | 23 |
| 2026 | 20 | 10 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Transparent substrates comprising three-dimensional porous conductive graphene films and methods for making the same8 Sep 2026US 12,729,153 B2Corning Incorporated
- Carbon nanotube hybrid materials and methods of producing the hybrid materials25 Aug 2026US 12,715,773 B2Chasm Advanced Materials, Inc.
- Substrate processing method and substrate processing apparatus25 Aug 2026US 12,721,058 B2Tokyo Electron Limited
- Reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology18 Aug 2026US 12,709,544 B2Instituto Superior Tecnico
- Graphene copper composite material preparation method based on combination of hot pressing sintering and chemical vapor deposition23 Jun 2026US 12,661,868 B2Crrc Industrial Institute Corporation Limited
- Porous carbon material, manufacturing method of the same, and energy storage device with the same24 Sep 2026US 2026/0285687 A13Dc Inc.
- Formation of graphene films from solid biomass-derived carbon sources by chemical vapor deposition17 Sep 2026US 2026/0274674 A1City University of Hong Kong
- A method of forming a graphene layer structure and a graphene substrate6 Aug 2026US 2026/0226652 A1Paragraf Limited
- Substrate retainer16 Jul 2026US 2026/0201560 A1Black Semiconductor Netherlands B.V.
- Film forming method and plasma processing apparatus25 Jun 2026US 2026/0179886 A1Tokyo Electron Limited
Most cited
By later US patents
- Method for producing graphene103US 9,822,009 B2Tokyo Electron Limited · 2017
- Intercalation electrode based on ordered graphene planes46US 9,356,281 B2GM Global Technology Operations LLC · 2016
- Large-area single- and few-layer graphene on arbitrary substrates37US 8,535,553 B2Massachusetts Institute of Technology · 2013
- Graphene sheet and method of preparing the same32US 7,988,941 B2Samsung Electronics Co., Ltd. · 2011
- Synthesis of graphene by chemical vapor deposition29US 9,388,048 B1University of Southern California · 2016