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US 9,388,048 B1Granted
Synthesis of graphene by chemical vapor deposition
AssigneeUniversity of Southern California
InventorsChongwu Zhou, Lewis Gomez De Arco, Yi Zhang
Life of this patent
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Abstract
Methods, materials and apparatus are described for synthesizing a monolayer or few-layers of graphene. Depositing the graphene can include, in some implementations, flowing hydrogen and carbon feedstock over a catalytic layer formed on a substrate.
Claims19
A method for synthesizing graphene, the method comprising:
- providing a substrate having a catalytic surface;
- and
- flowing a dilute carbon feedstock over the catalytic surface of the substrate at a pressure equal to atmospheric pressure or lower to deposit a single planar layer of graphene or a thin stack of planar graphene layers on the catalytic surface of the substrate, the planar layer of graphene or the thin stack of planar graphene layers being parallel to the catalytic surface of the substrate, wherein the dilute carbon feedstock has more than 2% and less than 15% by volume carbon feedstock and comprises at least one of hydrogen, helium, and argon, the thin stack of planar graphene layers comprises five or fewer layers of graphene, wherein the single planar layer of graphene or the thin stack of planar graphene layers, when disposed on a polyethylene terephthalate (PET) substrate, has a conductance that is unperturbed after complete bending cycles, wherein the graphene is synthesized without the use of any plasma discharge.
Dependencies are inferred from the claim text.