B41J 2/1642
Thin film formation by cvd [chemical vapor deposition]
Official title: {thin film formation by CVD [chemical vapor deposition]}
B41J2/1642 (Thin film formation by cvd [chemical vapor deposition]) appears on 2,920 US grants and 2,725 published applications in this corpus.
Search patents in B41J- Granted patents
- 2,920
- Published applications
- 2,725
- Assignees
- 196
- Inventors
- 1,898
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 7 | 0 |
| 1987 | 7 | 0 |
| 1988 | 7 | 0 |
| 1989 | 11 | 0 |
| 1990 | 10 | 0 |
| 1991 | 9 | 0 |
| 1992 | 16 | 0 |
| 1993 | 11 | 0 |
| 1994 | 5 | 0 |
| 1995 | 13 | 0 |
| 1996 | 14 | 0 |
| 1997 | 31 | 0 |
| 1998 | 41 | 0 |
| 1999 | 40 | 0 |
| 2000 | 60 | 0 |
| 2001 | 138 | 45 |
| 2002 | 143 | 112 |
| 2003 | 107 | 107 |
| 2004 | 107 | 215 |
| 2005 | 133 | 330 |
| 2006 | 187 | 205 |
| 2007 | 191 | 193 |
| 2008 | 210 | 287 |
| 2009 | 197 | 263 |
| 2010 | 245 | 189 |
| 2011 | 250 | 101 |
| 2012 | 101 | 70 |
| 2013 | 91 | 100 |
| 2014 | 90 | 52 |
| 2015 | 91 | 51 |
| 2016 | 52 | 40 |
| 2017 | 33 | 42 |
| 2018 | 31 | 50 |
| 2019 | 48 | 51 |
| 2020 | 47 | 30 |
| 2021 | 31 | 23 |
| 2022 | 20 | 38 |
| 2023 | 25 | 36 |
| 2024 | 24 | 32 |
| 2025 | 21 | 33 |
| 2026 | 13 | 30 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Liquid discharge head and liquid discharge apparatus25 Aug 2026US 12,715,214 B2Ricoh Company, Ltd.
- Substrate joined body7 Jul 2026US 12,673,495 B2Canon Kabushiki Kaisha
- Single crystal silicon substrate, liquid discharge head, and method for manufacturing single crystal silicon substrate16 Jun 2026US 12,654,445 B2Seiko Epson Corporation
- Method for manufacturing substrate bonded body and method for manufacturing liquid ejection substrate21 Apr 2026US 12,605,933 B2Canon Kabushiki Kaisha
- Method for producing laminates and method for producing liquid discharge heads14 Apr 2026US 12,600,134 B2Canon Kabushiki Kaisha
- Liquid ejection head substrate and method for manufacturing liquid ejection head substrate10 Sep 2026US 2026/0264403 A1Canon Kabushiki Kaisha
- Manufacturing method of liquid discharge head and liquid discharge head10 Sep 2026US 2026/0264405 A1Seiko Epson Corporation
- Inkjet printing apparatus, inkjet printing method, and electronic device3 Sep 2026US 2026/0257477 A1Samsung Display Co., Ltd.
- Method of manufacturing liquid discharge head, and liquid discharge head27 Aug 2026US 2026/0249613 A1Canon Kabushiki Kaisha
- Manufacturing method for semiconductor substrate, manufacturing method for liquid ejection head, semiconductor substrate, and liquid ejection head13 Aug 2026US 2026/0233519 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Ink jet head and a method of manufacturing thereof420US 5,666,141 ASharp Kabushiki Kaisha · 1997
- Polymer-based micromachining for microfluidic devices351US 6,136,212 AThe Regents of the University of Michigan · 2000
- Ink jet print device and print head or print apparatus using the same348US 6,019,457 ACanon Information Systems Research Australia Pty. Ltd. · 2000
- Method of fabricating bubblejet print devices using semiconductor fabrication techniques311US 5,841,452 ACanon Information Systems Research Australia Pty. Ltd. · 1998
- Document having an encoded data structure288US 7,234,645 B2Silverbrook Research Pty Ltd · 2007