Manufacturing method of liquid discharge head and liquid discharge head

Abstract

A manufacturing method of a liquid discharge head includes forming an insulating film at a first surface of a substrate formed of single crystal silicon, forming a first layer formed of polycrystalline silicon on the insulating film by deposition, and forming, at the first layer, a first recessed portion that serves as a first nozzle, the first recessed portion having a bottom surface that is the insulating film. In addition, the liquid discharge head includes a first layer formed of polycrystalline silicon, a second layer formed of single crystal silicon, an insulating film provided between the first layer and the second layer, a first nozzle disposed at the first layer, and a second nozzle disposed at the second layer, the second nozzle penetrating the first nozzle through an opening of the insulating film.

Dependencies are inferred from the claim text.