B08B 1/52
Using fluids
Official title: using fluids
B08B1/52 (Using fluids) appears on 145 US grants and 136 published applications in this corpus.
Search patents in B08B- Granted patents
- 145
- Published applications
- 136
- Assignees
- 84
- Inventors
- 368
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 9 | 0 |
| 1998 | 6 | 0 |
| 1999 | 13 | 0 |
| 2000 | 10 | 0 |
| 2001 | 5 | 2 |
| 2002 | 6 | 2 |
| 2003 | 5 | 2 |
| 2004 | 0 | 0 |
| 2005 | 2 | 7 |
| 2006 | 1 | 4 |
| 2007 | 2 | 4 |
| 2008 | 1 | 1 |
| 2009 | 1 | 6 |
| 2010 | 1 | 2 |
| 2011 | 5 | 3 |
| 2012 | 0 | 2 |
| 2013 | 4 | 1 |
| 2014 | 2 | 3 |
| 2015 | 1 | 3 |
| 2016 | 1 | 4 |
| 2017 | 2 | 4 |
| 2018 | 1 | 10 |
| 2019 | 1 | 9 |
| 2020 | 12 | 11 |
| 2021 | 4 | 11 |
| 2022 | 8 | 12 |
| 2023 | 12 | 6 |
| 2024 | 7 | 7 |
| 2025 | 10 | 15 |
| 2026 | 2 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor wafer cleaning apparatus28 Apr 2026US 12,616,000 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Breaking-in and cleaning method and apparatus for wafer-cleaning brush24 Feb 2026US 12,563,994 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Wafer cleaning apparatus30 Dec 2025US 12,507,794 B2Samsung Electronics Co., Ltd.
- System and process for removing debris from plastic sheets30 Dec 2025US 12,508,630 B2Signode India Ltd.
- Substrate cleaning apparatus, polishing apparatus, buffing apparatus, substrate cleaning method, substrate processing apparatus, and machine learning apparatus2 Dec 2025US 12,485,516 B2Ebara Corporation
- Printer and maintenance method of ink absorbing roller10 Sep 2026US 2026/0264408 A1SCREEN Holdings Co., Ltd.
- Ink Station Washing Assembly For A Can Decorator, Ink Station Roller Assembly For A Can Decorator, And Methods Of Making, Using, And Cleaning Same13 Aug 2026US 2026/0233511 A1Stolle Machinery Company, LLC
- Drain cup module, substrate wetting apparatus including the same, and substrate processing method using the same4 Jun 2026US 2026/0151805 A1Samsung Electronics Co., Ltd.
- Substrate treating method and substrate treating apparatus26 Mar 2026US 2026/0084187 A1Semes Co., Ltd.
- Substrate processing apparatus15 Jan 2026US 2026/0014593 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Continuous processing system for chemical mechanical polishing501US 5,738,574 AAPPLIED Materials.Inc. · 1998
- Double-sided substrate cleaning apparatus160US 5,518,542 ATokyo Electron Kyushu Limited · 1996
- Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates89US 6,368,197 B2Micron Technology, Inc. · 2002
- Device having brush for scrubbing substrate84US 5,375,291 ATokyo Electron Kyushu Limited · 1994
- Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates78US 6,244,944 B1Micron Technology, Inc. · 2001