Unity Semiconductor Corporation
Dresden, FR· latest recorded location
Unity Semiconductor Corporation is named on 27 US grants and 20 published applications in this corpus. Its most frequent classification is G01B (Measuring length, thickness or similar linear dimensions).
- Granted patents
- 27
- Published applications
- 20
- Inventors
- 27
- Granted in 2026 so far
- 1
- Most recent grant
- 31 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2017 | 1 | 1 |
| 2018 | 6 | 3 |
| 2019 | 2 | 2 |
| 2020 | 1 | 1 |
| 2021 | 1 | 4 |
| 2022 | 2 | 2 |
| 2023 | 1 | 4 |
| 2024 | 10 | 2 |
| 2025 | 2 | 1 |
| 2026 | 1 | 0 |
By publication year. 2026 runs to 8 Oct.
Technology areas
Share of 47 documents
- G01BMeasuring length, thickness or similar linear dimensions31
- G01NInvestigating or analysing materials by determining their chemical or physical properties29
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered17
- G02BOptical elements, systems or apparatus6
- G06TImage data processing or generation, in general6
- B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural4
- G01MTesting static or dynamic balance of machines or structures4
- G01RMeasuring electric variables4
- G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of3
- B24BMachines, devices, or processes for grinding or polishing2
Recent patents
- Method and system for discriminating defects present on a frontside from defects present on a backside of a transparent substrate31 Mar 2026US 12,590,905 B2
- Method and a system for characterising structures through a substrate14 Oct 2025US 12,444,039 B2
- Method and a device for detecting crystalline defects in a substrate by dark field and photoluminescence14 Jan 2025US 12,196,681 B1
- System for optical inspection of a substrate using same or different wavelengths10 Dec 2024US 12,163,899 B2
- Method and a system for characterizing structures through a substrate22 Oct 2024US 12,123,698 B1
- A method and system for discriminating defects present on a frontside from defects present on a backside of a transparent substrate13 Feb 2025US 2025/0052692 A1
- Method and a system for characterising structures through a substrate22 Aug 2024US 2024/0281955 A1
- System for optical inspection of a substrate using same or different wavelengths29 Feb 2024US 2024/0068956 A1
- Method and a system for characterising structures etched in a substrate23 Nov 2023US 2023/0375332 A1
- Method and a system for combined characterisation of structures etched in a substrate23 Nov 2023US 2023/0375333 A1
Most cited
By later US patents
- Chromatic confocal device and method for 2D/3D inspection of an object such as a wafer9US 9,739,600 B12017
- Integrated chromatic confocal sensor3US 10,082,425 B22018
- Substrate dimension adapter2US 12,074,400 B12024
- Method and system for inspecting wafers for electronics, optics or optoelectronics2US 9,857,313 B22018
- Device and method for positioning a photolithography mask by a contactless optical method2US 9,897,927 B22018