Electron Vision Corporation
San Diego, CA, US· latest recorded location
Electron Vision Corporation is named on 17 US grants and 1 published applications in this corpus. Its most frequent classification is H10P (Generic processes or apparatus for the manufacture or treatment of devices covered).
- Granted patents
- 17
- Published applications
- 1
- Inventors
- 13
- Granted in 2026 so far
- 0
- Most recent grant
- 19 Aug 2003
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 7 | 1 |
| 2002 | 4 | 0 |
| 2003 | 3 | 0 |
By publication year.
Technology areas
Share of 18 documents
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered11
- H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by8
- G03FPhotomechanical production of textured or patterned surfaces5
- C23CCoating metallic material4
- Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4
- H01JElectric discharge tubes or discharge lamps2
- C09DCoating compositions1
- H02NElectric machines not otherwise provided for1
- H10DInorganic electric semiconductor devices1
- Y10TTechnical subjects covered by former us classification1
Recent patents
- Method for curing spin-on dielectric films utilizing electron beam radiation19 Aug 2003US 6,607,991 B1
- Electron beam annealing of metals, alloys, nitrides and silicides22 Apr 2003US 6,551,926 B1
- Method of processing films prior to chemical vapor deposition using electron beam processing15 Apr 2003US 6,548,899 B2
- Method for controlling dopant profiles and dopant activation by electron beam processing3 Dec 2002US 6,489,225 B1
- Electron beam modification of perhydrosilazane spin-on glass30 Jul 2002US 6,426,127 B1
Most cited
By later US patents
- Large-area uniform electron source137US 5,003,178 A1991
- Method of processing films prior to chemical vapor deposition using electron beam processing72US 6,548,899 B22003
- Method for curing spin-on-glass film utilizing electron beam radiation62US 6,132,814 A2000
- Method for three-dimensional control of solubility properties of resist layers61US 5,468,595 A1995
- Enhancement of photoresist plasma etch resistance via electron beam surface cure54US 6,358,670 B12002