Method for curing spin-on-glass film utilizing electron beam radiation

A method for curing spin-on-glass materials on a substrate, comprising the steps of:

• placing or leaving a spin-on-glass layer formed on a substrate;
• placing the substrate on a cooling plate;
• irradiating the spin-on-glass layer with a large-area electron beam at a dose level greater than approximately 2,500 .mu.C/cm.sup.2, and providing substantially uniform exposure of the surface of the spin-on-glass layer and having sufficient energy to penetrate the layer;
• continuing the irradiating step to reach a dose level sufficient to cure the spin-on-glass layer to such a degree that the layer attains enhanced physical properties relative to those obtained by thermal curing at a relatively low temperature;
• simultaneously applying heat to the spin-on-glass layer, as a result of energy supplied by the large-area electron beam;
• and
• maintaining the layer and the semiconductor substrate at a low temperature relative to those required for complete curing by thermal means, wherein the maintaining step is effected by means of the cooling plate;
• whereby the spin-on-glass layer is cured without cracking or other damage.

A method for curing spin-on-glass materials on a substrate, comprising the steps of:

• placing or leaving a spin-on-glass layer formed on a substrate;
• irradiating the spin-on-glass layer with a large-area electron beam at a dose level greater than approximately 2,500 .mu.C/cm.sup.2, generated in a vacuum chamber and providing substantially uniform exposure of the surface of the spin-on-glass layer and having sufficient energy to penetrate the layer;
• continuing the irradiating step to reach a dose level sufficient to cure the spin-on-glass layer;
• and
• simultaneously applying heat to the spin-on-glass layer, but maintaining the layer at a low temperature relative to those required for complete curing by thermal means;
• whereby the spin-on-glass layer is cured without cracking or other damage.

A method for curing spin-on-glass materials on a substrate, comprising the steps of:

• placing or leaving a spin-on-glass layer formed on a substrate;
• irradiating the spin-on-glass layer with a large-area electron beam at a dose level greater than approximately 2,500 .mu.C/cm.sup.2, and providing substantially uniform exposure of the surface of the spin-on-glass layer and having sufficient energy to penetrate the layer;
• continuing the irradiating step to reach a dose level sufficient to cure the spin-on-glass layer to such a degree that the layer attains enhanced physical properties relative to those obtained by thermal curing at a relatively low temperature;
• simultaneously applying heat to the spin-on-glass layer, but maintaining the layer at a low temperature relative to those required for complete curing by thermal means;
• maintaining in the vacuum chamber a soft vacuum having a relatively high vacuum pressure in the range of 10-40 millitorr, whereby any surface charge build-up, occurring as a result of electron irradiation of the spin-on-glass layer, is neutralized by positive ions formed near the surface of the layer;
• and
• inducing increased conductivity in the spin-on-glass layer, as a result of the impinging electron beam and increased temperature, whereby electrical charge is more readily dissipated from subsurface layers of spin-on-glass, and the occurrence of electron/hole traps associated with electron beam radiation is reduced or eliminated;
• and
• whereby the spin-on-glass layer is cured without cracking or other damage.

A method for curing spin-on-glass materials on a substrate, comprising the steps of:

• placing or leaving a spin-on-glass layer formed on a substrate;
• irradiating the spin-on-glass layer with a large-area electron beam at a dose level greater than approximately 2,500 .mu.C/cm.sup.2 ;
• and
• continuing the irradiating step to reach a dose level sufficient to cure the spin-on-glass layer;
• whereby the spin-on-glass layer is cured without cracking or other damage.